Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A1 | O15245 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | LSS | P48449 | 1/20 | 0.31 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | BBOX1 | O75936 | 2/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formic Acid SCHEMBL11663824 | 0.88 | PSMD14 (0.39) | DNM1 | |
| Tributylmethylammonium SCHEMBL557487 | 0.83 | SLC22A1 (0.41) | SLC22A1LSSDNM1TSHRBBOX1 | |
| Formic Acid SCHEMBL4540401 | 0.82 | DNM1 (0.39) | SLC22A1DNM1TSHRBBOX1CHRM2 | |
| Formic Acid SCHEMBL556868 | 0.82 | SLC22A1 (0.35) | SLC22A1ALDH1A1DNM1TSHRBBOX1 | |
| Formic Acid SCHEMBL5574268 | 0.81 | LSS (0.48) | SLC22A1LSSDNM1 | |
| SCHEMBL144694 | 0.80 | SLC22A1 (0.50) | SLC22A1LSSDNM1 | |
| Formic Acid SCHEMBL5346399 | 0.79 | LSS (0.52) | SLC22A1ALDH1A1LSSDNM1TSHR | |
| Formic Acid SCHEMBL5574345 | 0.79 | LSS (0.52) | SLC22A1ALDH1A1LSSDNM1TSHR | |
| Formic Acid SCHEMBL5574121 | 0.79 | LSS (0.52) | SLC22A1ALDH1A1LSSDNM1TSHR | |
| Formic Acid SCHEMBL5570517 | 0.79 | LSS (0.52) | SLC22A1ALDH1A1LSSDNM1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1669383-B1 | CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME | TOSOH CORP (JP) | 2014-11-12 | — | — | EP | claimed |
| US-8779018-B2 | Catalyst composition for production of rigid polyurethane foam and isocyanurate-modified rigid polyurethane foam and raw-material composition containing the same | TOSOH CORPORATION (JP) | 2014-07-15 | — | — | US | claimed |
| EP-2050775-B1 | CATALYST COMPOSITION FOR POLYURETHANE RESIN PRODUCTION AND METHOD FOR PRODUCING POLYURETHANE RESIN | TOSOH CORP (JP) | 2013-08-14 | — | — | EP | claimed |
| US-20120035289-A1 | CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME | TOSOH CORPORATION (JP) | 2012-02-09 | — | — | US | claimed |
| CN-101501092-B | Catalyst composition for polyurethane resin production and method for producing polyurethane resin | TOSOH CORP | 2011-09-28 | — | — | CN | claimed |
| US-20100130629-A1 | CATALYST COMPOSITION FOR PRODUCTION OF POLYURETHANE RESIN AND METHOD FOR PRODUCING POLYURETHANE RESIN (AS AMENDED) | TOSOH CORPORATION (JP) | 2010-05-27 | — | — | US | claimed |
| CN-101501092-A | Catalyst composition for polyurethane resin production and method for producing polyurethane resin | TOSOH CORP (JP) | 2009-08-05 | — | — | CN | claimed |
| EP-2050775-A1 | CATALYST COMPOSITION FOR POLYURETHANE RESIN PRODUCTION AND METHOD FOR PRODUCING POLYURETHANE RESIN | Tosoh Corporation (JP) | 2009-04-22 | — | — | EP | claimed |
| US-20070112085-A1 | Catalyst composition for production of rigid polyurethane foam and isocyanurate-modified rigid polysurethane foam and raw-material composition containing the same | TOSOH CORPORATION (JP) | 2007-05-17 | — | — | US | claimed |
| EP-1669383-A1 | CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME | Tosoh Corporation (JP) | 2006-06-14 | — | — | EP | claimed |
| EP-1669383-B1 | CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME | TOSOH CORP (JP) | 2014-11-12 | — | — | EP | disclosed |
| US-8877825-B2 | Catalyst composition for production of polyurethane resin and method for producing polyurethane resin | TOSOH CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8779018-B2 | Catalyst composition for production of rigid polyurethane foam and isocyanurate-modified rigid polyurethane foam and raw-material composition containing the same | TOSOH CORPORATION (JP) | 2014-07-15 | — | — | US | disclosed |
| EP-2050775-B1 | CATALYST COMPOSITION FOR POLYURETHANE RESIN PRODUCTION AND METHOD FOR PRODUCING POLYURETHANE RESIN | TOSOH CORP (JP) | 2013-08-14 | — | — | EP | disclosed |
| US-20120035289-A1 | CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME | TOSOH CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20070112085-A1 | Catalyst composition for production of rigid polyurethane foam and isocyanurate-modified rigid polysurethane foam and raw-material composition containing the same | TOSOH CORPORATION (JP) | 2007-05-17 | — | — | US | disclosed |
| US-7132473-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-07 | — | — | US | disclosed |
| EP-1669383-A1 | CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME | Tosoh Corporation (JP) | 2006-06-14 | — | — | EP | disclosed |
| EP-1568744-A1 | COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-31 | — | — | EP | disclosed |
| US-20040219372-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-04 | — | — | US | disclosed |