SCHEMBL556910

SCHEMBL556910

CCCCCCCC([Si](C)(OCC)OCC)[Si](C)(OCC)OCC

nearest known ligand 0.39

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.39
SMPD1 P17405 3/20 0.38
FDPS P14324 4/20 0.38
LMNA P02545 1/20 0.37
DNM1 Q05193 2/20 0.36
TSHR P16473 1/20 0.35
THRB P10828 1/20 0.35
GPR84 Q9NQS5 2/20 0.33
ZDHHC7 Q9NXF8 1/20 0.33
SPHK1 Q9NYA1 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6707409 1.00 OPRM1 (0.39) OPRM1SMPD1FDPSLMNADNM1
SCHEMBL6707424 1.00 OPRM1 (0.39) OPRM1SMPD1FDPSLMNADNM1
SCHEMBL1123098 1.00 OPRM1 (0.39) OPRM1SMPD1FDPSLMNADNM1
SCHEMBL1123629 0.98 OPRM1 (0.41) OPRM1SMPD1FDPSLMNADNM1
SCHEMBL15066888 0.91 DNM1 (0.33) OPRM1FDPSDNM1
SCHEMBL1820602 0.83 OPRM1 (0.34) OPRM1SMPD1FDPSLMNADNM1
SCHEMBL6708434 0.83 OPRM1 (0.39) OPRM1FDPSLMNADNM1GPR84
SCHEMBL557560 0.83 OPRM1 (0.39) OPRM1FDPSLMNADNM1GPR84
SCHEMBL6706822 0.83 OPRM1 (0.39) OPRM1FDPSLMNADNM1GPR84
SCHEMBL6708445 0.83 OPRM1 (0.39) OPRM1FDPSLMNADNM1GPR84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9074032-B2 Membranes based on polyvinyl alcohol WACKER CHEMIE AG (DE) 2015-07-07 US disclosed
US-8852737-B2 Coating composition and photochromic optical article TOKUYAMA CORPORATION (JP) 2014-10-07 US disclosed
US-8557377-B2 Photochromic optical element TOKUYAMA CORPORATION (JP) 2013-10-15 US disclosed
EP-2414411-B1 MEMBRANES BASED ON POLYVINYL ALCOHOL WACKER CHEMIE AG (DE) 2013-02-20 EP disclosed
US-20120031843-A1 Membranes based on polyvinyl alcohol WACKER CHEMIE AG (DE) 2012-02-09 US disclosed
EP-1619692-B1 PROTON-CONDUCTIVE FILM, PROCESS FOR PRODUCING THE SAME, AND FUEL CELL EMPOLYING THE PROTON-CONDUCTIVE FILM SEKISUI CHEMICAL CO LTD (JP) 2011-02-09 EP disclosed
US-20100233485-A1 Photochromic Optical Element TOKUYAMA CORPORATION (JP) 2010-09-16 US disclosed
US-20100110521-A1 COATING COMPOSITION AND PHOTOCHROMIC OPTICAL ARTICLE TOKUYAMA CORPORATION 2010-05-06 US disclosed
EP-2113542-A1 COATING COMPOSITION AND PHOTOCHROMIC OPTICAL ARTICLE TOKUYAMA CORPORATION (JP) 2009-11-04 EP disclosed
EP-1978382-A1 PHOTOCHROMIC OPTICAL ELEMENT Tokuyama Corporation (JP) 2008-10-08 EP disclosed
US-20070213495-A1 Proton conducting membrane, method for producing the same, and fuel cell using the same SEKISUI CHEMICAL COL.,LTD. (JP) 2007-09-13 US disclosed
US-7214756-B2 Heat resistance, durability, dimensional stability and fuel barrier characteristics SEKISUI CHEMICAL CO., LTD. (JP) 2007-05-08 US disclosed
US-20060219981-A1 Proton conductive film, process for producing the same, and fuel cell employing the proton-conductive film SEKISUI CHEMICAL CO., LTD. (JP) 2006-10-05 US disclosed
EP-1619692-A1 PROTON-CONDUCTIVE FILM, PROCESS FOR PRODUCING THE SAME, AND FUEL CELL EMPOLYING THE PROTON-CONDUCTIVE FILM SEKISUI CHEMICAL CO., LTD. (JP) 2006-01-25 EP disclosed
EP-1441365-A1 PROTON CONDUCTING MEMBRANE-PROCESS FOR ITS PRODUCTION-AND FUEL CELLS MADE BY USING THE SAME SEKISUI CHEMICAL CO., LTD. (JP) 2004-07-28 EP disclosed
US-20040062970-A1 Heat resistance, durability, dimensional stability and fuel barrier characteristics SEKISUI CHEMICAL CO., LTD. (JP) 2004-04-01 US disclosed
US-20040028978-A1 Proton conducting membrane, method for producing the same, and fuel cell using the same NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2004-02-12 US disclosed
EP-1334993-A2 Proton conducting membrane, method for producing the same, and fuel cell using the same National Institute of Advanced Industrial Science and Technology (JP) 2003-08-13 EP disclosed