Pivalate

Pivalate

SCHEMBL5572286

CC(C)(C)C(=O)O.CCCN(CCC)CCC

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 4/20 0.42
CA9 Q16790 3/20 0.42
CA2 P00918 1/20 0.42
TSHR P16473 3/20 0.36
ALDH1A1 P00352 2/20 0.36
CYP2C19 P33261 2/20 0.35
CYP2D6 P10635 1/20 0.35
HIF1A Q16665 1/20 0.35
CA1 P00915 3/20 0.34
MAPK1 P28482 1/20 0.34
KDM4C Q9H3R0 1/20 0.34
FFAR3 O14843 2/20 0.33
CA7 P43166 1/20 0.33
CA14 Q9ULX7 1/20 0.33
MEN1 O00255 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C9 P11712 1/20 0.33
KMT2A Q03164 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HDAC3 O15379 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL5875239 0.83 CA12 (0.50) CA12CA9CA2TSHRALDH1A1
Bicarbonate SCHEMBL5875232 0.83 CA12 (0.50) CA12CA9CA2TSHRALDH1A1
Trifluoroacetic Acid SCHEMBL5874626 0.82 CA12 (0.41) CA12CA9CA2TSHRCA1
Trichloroacetic Acid SCHEMBL5874410 0.82 TSHR (0.50) CA12CA9CA2TSHRALDH1A1
Pivalate SCHEMBL28486662 0.81 KDM5A (0.50) TSHRALDH1A1KDM4CMEN1KMT2A
Acetic Acid SCHEMBL5571031 0.80 CA12 (0.48) CA12CA9CA2TSHRALDH1A1
Oxalic Acid SCHEMBL5874925 0.80 CA12 (0.48) CA12CA9CA2TSHRALDH1A1
Oxalic Acid SCHEMBL5874919 0.80 CA12 (0.48) CA12CA9CA2TSHRALDH1A1
Pivalate SCHEMBL28255434 0.80 TSHR (0.47) CA2TSHRALDH1A1CYP2C19CYP2D6
Hydrogen Peroxide SCHEMBL139780 0.80 CA12 (0.43) CA12CA9CA2TSHRCYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070135565-A1 COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-06-14 US disclosed
US-7132473-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-11-07 US disclosed
EP-1568744-A1 COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-08-31 EP disclosed
US-20040219372-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-11-04 US disclosed