SCHEMBL5574368

SCHEMBL5574368

CC(C)C(=O)O.CC(C)C(C)(C)N

nearest known ligand 0.59

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.40
TP53 P04637 1/20 0.40
MAPT P10636 1/20 0.40
PTGS1 P23219 1/20 0.40
SLC7A5 Q01650 2/20 0.39
CYP1A2 P05177 1/20 0.37
CYP2D6 P10635 1/20 0.37
GABRR1 P24046 2/20 0.35
TSHR P16473 1/20 0.33
ARG1 P05089 1/20 0.32
ARG2 P78540 1/20 0.32
SLC1A3 P43003 1/20 0.31
SLC1A2 P43004 1/20 0.31
SLC1A1 P43005 1/20 0.31
GRIK1 P39086 1/20 0.30
ENPEP Q07075 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL1896980 0.88 CYP1A2 (0.39) ALDH1A1TP53MAPTPTGS1SLC7A5
Bicarbonate SCHEMBL1896976 0.88 CYP1A2 (0.39) ALDH1A1TP53MAPTPTGS1SLC7A5
Lactic Acid SCHEMBL5570499 0.86 TP53 (0.61) ALDH1A1TP53MAPTPTGS1SLC7A5
Acetic Acid SCHEMBL3691254 0.85 FFAR3 (0.44) ALDH1A1TP53MAPTPTGS1SLC7A5
Tert-Butylamine SCHEMBL28283589 0.85 TP53 (0.42) ALDH1A1TP53MAPTPTGS1SLC7A5
Pivalate SCHEMBL4928422 0.82 CYP2D6 (0.41) ALDH1A1TP53MAPTPTGS1SLC7A5
SCHEMBL8423443 0.79 ALDH1A1 (0.42) ALDH1A1TP53MAPTPTGS1SLC7A5
SCHEMBL8420027 0.79 ALDH1A1 (0.42) ALDH1A1TP53MAPTPTGS1SLC7A5
SCHEMBL10644198 0.78 DGAT1 (0.36) ALDH1A1TP53MAPTPTGS1SLC7A5
Trifluoroacetic Acid SCHEMBL20479433 0.78 CYP1A2 (0.39) ALDH1A1MAPTPTGS1SLC7A5CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070135565-A1 COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2007-06-14 US disclosed
US-7132473-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2006-11-07 US disclosed
EP-1568744-A1 COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 2005-08-31 EP disclosed
US-20040219372-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 2004-11-04 US disclosed