Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A1 | O15245 | 2/20 | 0.41 |
| ▸ | DNM1 | Q05193 | 9/20 | 0.40 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.38 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.38 |
| ▸ | MMP2 | P08253 | 1/20 | 0.38 |
| ▸ | RAD52 | P43351 | 1/20 | 0.38 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | BBOX1 | O75936 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formic Acid SCHEMBL5574272 | 0.92 | DNM1 (0.48) | SLC22A1DNM1HTTSLC22A2 | |
| Formic Acid SCHEMBL15732741 | 0.90 | DNM1 (0.52) | SLC22A1DNM1HTT | |
| Formic Acid SCHEMBL5574352 | 0.90 | DNM1 (0.52) | SLC22A1DNM1HTT | |
| Formic Acid SCHEMBL5346402 | 0.90 | DNM1 (0.52) | SLC22A1DNM1HTT | |
| Formic Acid SCHEMBL5570521 | 0.90 | DNM1 (0.52) | SLC22A1DNM1HTT | |
| Tributylmethylammonium SCHEMBL17238744 | 0.86 | SLC22A1 (0.43) | SLC22A1DNM1TSHRHTTSLC22A2 | |
| Formic Acid SCHEMBL5574500 | 0.84 | DNM1 (0.55) | SLC22A1DNM1RAD52TSHRBBOX1 | |
| Tributylmethylammonium SCHEMBL557487 | 0.84 | SLC22A1 (0.41) | SLC22A1DNM1TSHRBBOX1HTT | |
| Formic Acid SCHEMBL556868 | 0.83 | SLC22A1 (0.35) | SLC22A1DNM1PSMD14PLA2G1BMMP2 | |
| Tributylmethylammonium SCHEMBL93610 | 0.83 | SLC22A1 (0.56) | SLC22A1DNM1HTTSLC22A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1669383-B1 | CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME | TOSOH CORP (JP) | 2014-11-12 | — | — | EP | claimed |
| US-8779018-B2 | Catalyst composition for production of rigid polyurethane foam and isocyanurate-modified rigid polyurethane foam and raw-material composition containing the same | TOSOH CORPORATION (JP) | 2014-07-15 | — | — | US | claimed |
| US-8575245-B2 | Tunable polymer compositions | NOVOMER, INC. (US) | 2013-11-05 | — | — | US | claimed |
| EP-2050775-B1 | CATALYST COMPOSITION FOR POLYURETHANE RESIN PRODUCTION AND METHOD FOR PRODUCING POLYURETHANE RESIN | TOSOH CORP (JP) | 2013-08-14 | — | — | EP | claimed |
| US-20120035289-A1 | CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME | TOSOH CORPORATION (JP) | 2012-02-09 | — | — | US | claimed |
| US-20110257296-A1 | TUNABLE POLYMER COMPOSITIONS | NOVOMER, INC. (US) | 2011-10-20 | — | — | US | claimed |
| WO-2010075232-A1 | TUNABLE POLYMER COMPOSITIONS | NOVOMER, INC. (US) | 2010-07-01 | — | — | WO | claimed |
| US-20100130629-A1 | CATALYST COMPOSITION FOR PRODUCTION OF POLYURETHANE RESIN AND METHOD FOR PRODUCING POLYURETHANE RESIN (AS AMENDED) | TOSOH CORPORATION (JP) | 2010-05-27 | — | — | US | claimed |
| EP-2050775-A1 | CATALYST COMPOSITION FOR POLYURETHANE RESIN PRODUCTION AND METHOD FOR PRODUCING POLYURETHANE RESIN | Tosoh Corporation (JP) | 2009-04-22 | — | — | EP | claimed |
| US-20070112085-A1 | Catalyst composition for production of rigid polyurethane foam and isocyanurate-modified rigid polysurethane foam and raw-material composition containing the same | TOSOH CORPORATION (JP) | 2007-05-17 | — | — | US | claimed |
| EP-1669383-A1 | CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME | Tosoh Corporation (JP) | 2006-06-14 | — | — | EP | claimed |
| EP-1669383-B1 | CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME | TOSOH CORP (JP) | 2014-11-12 | — | — | EP | disclosed |
| US-8877825-B2 | Catalyst composition for production of polyurethane resin and method for producing polyurethane resin | TOSOH CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8779018-B2 | Catalyst composition for production of rigid polyurethane foam and isocyanurate-modified rigid polyurethane foam and raw-material composition containing the same | TOSOH CORPORATION (JP) | 2014-07-15 | — | — | US | disclosed |
| US-8575245-B2 | Tunable polymer compositions | NOVOMER, INC. (US) | 2013-11-05 | — | — | US | disclosed |
| US-20070112085-A1 | Catalyst composition for production of rigid polyurethane foam and isocyanurate-modified rigid polysurethane foam and raw-material composition containing the same | TOSOH CORPORATION (JP) | 2007-05-17 | — | — | US | disclosed |
| US-7132473-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-07 | — | — | US | disclosed |
| EP-1669383-A1 | CATALYST COMPOSITION FOR PRODUCTION OF RIGID POLYURETHANE FOAM AND ISOCYANURATE-MODIFIED RIGID POLYURETHANE FOAM AND RAW-MATERIAL COMPOSITION CONTAINING THE SAME | Tosoh Corporation (JP) | 2006-06-14 | — | — | EP | disclosed |
| EP-1568744-A1 | COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-31 | — | — | EP | disclosed |
| US-20040219372-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-04 | — | — | US | disclosed |