Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 12/20 | 0.52 |
| ▸ | HTT | P42858 | 2/20 | 0.50 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.48 |
| ▸ | LSS | P48449 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formic Acid SCHEMBL15732741 | 1.00 | DNM1 (0.52) | DNM1HTTSLC22A1LSSKMT2A | |
| Formic Acid SCHEMBL5574352 | 1.00 | DNM1 (0.52) | DNM1HTTSLC22A1LSSKMT2A | |
| Formic Acid SCHEMBL5346402 | 1.00 | DNM1 (0.52) | DNM1HTTSLC22A1LSSKMT2A | |
| Formic Acid SCHEMBL5574272 | 0.98 | DNM1 (0.48) | DNM1HTTSLC22A1LSSKMT2A | |
| Tributylmethylammonium SCHEMBL557488 | 0.90 | SLC22A1 (0.41) | DNM1HTTSLC22A1 | |
| Formic Acid SCHEMBL5574345 | 0.86 | LSS (0.52) | DNM1HTTSLC22A1LSSKMT2A | |
| Formic Acid SCHEMBL5570529 | 0.86 | DNM1 (0.71) | DNM1HTTSLC22A1KMT2A | |
| Formic Acid SCHEMBL2533294 | 0.86 | DNM1 (0.71) | DNM1HTTSLC22A1KMT2A | |
| Formic Acid SCHEMBL5570517 | 0.86 | LSS (0.52) | DNM1HTTSLC22A1LSSKMT2A | |
| Formic Acid SCHEMBL558269 | 0.86 | DNM1 (0.71) | DNM1HTTSLC22A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070135565-A1 | COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-7132473-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-07 | — | — | US | disclosed |
| EP-1568744-A1 | COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-31 | — | — | EP | disclosed |
| US-20040219372-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-04 | — | — | US | disclosed |