Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 7/20 | 0.54 |
| ▸ | NPC1 | O15118 | 6/20 | 0.54 |
| ▸ | RAB9A | P51151 | 6/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.54 |
| ▸ | MAPT | P10636 | 3/20 | 0.54 |
| ▸ | HPGD | P15428 | 2/20 | 0.54 |
| ▸ | TP53 | P04637 | 1/20 | 0.54 |
| ▸ | PKM | P14618 | 1/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.54 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.54 |
| ▸ | FBP1 | P09467 | 1/20 | 0.54 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.54 |
| ▸ | DRD2 | P14416 | 1/20 | 0.54 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.54 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.54 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.54 |
| ▸ | DRD1 | P21728 | 1/20 | 0.54 |
| ▸ | MC5R | P33032 | 1/20 | 0.54 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10669342 | 0.98 | SMN1; SMN2 (0.52) | SMN1; SMN2NPC1RAB9AALDH1A1HSD17B10 | |
| Ammonia Solution, Strong SCHEMBL4408280 | 0.98 | SMN1; SMN2 (0.52) | SMN1; SMN2NPC1RAB9AALDH1A1HSD17B10 | |
| Water SCHEMBL28902586 | 0.98 | SMN1; SMN2 (0.52) | SMN1; SMN2NPC1RAB9AALDH1A1HSD17B10 | |
| SCHEMBL30074811 | 0.98 | SMN1; SMN2 (0.52) | SMN1; SMN2NPC1RAB9AALDH1A1HSD17B10 | |
| Iodide SCHEMBL4618865 | 0.98 | SMN1; SMN2 (0.52) | SMN1; SMN2NPC1RAB9AALDH1A1HSD17B10 | |
| SCHEMBL10665140 | 0.98 | SMN1; SMN2 (0.52) | SMN1; SMN2NPC1RAB9AALDH1A1HSD17B10 | |
| SCHEMBL2148044 | 0.98 | SMN1; SMN2 (0.52) | SMN1; SMN2NPC1RAB9AALDH1A1HSD17B10 | |
| Bromide SCHEMBL887893 | 0.98 | SMN1; SMN2 (0.52) | SMN1; SMN2NPC1RAB9AALDH1A1HSD17B10 | |
| Hydrochloric Acid SCHEMBL7776250 | 0.98 | SMN1; SMN2 (0.52) | SMN1; SMN2NPC1RAB9AALDH1A1HSD17B10 | |
| Iodomethane SCHEMBL4047719 | 0.96 | SMN1; SMN2 (0.50) | SMN1; SMN2NPC1RAB9AALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 10211 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12630744-B2 | Polishing compositions and methods of use thereof | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2026-05-19 | — | — | US | claimed |
| US-12590224-B2 | Chemical mechanical polishing compositions and methods of use thereof | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2026-03-31 | — | — | US | claimed |
| EP-3631045-B1 | CHEMICAL MECHANICAL POLISHING SLURRY FOR COBALT APPLICATIONS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2026-02-18 | — | — | EP | claimed |
| US-20260042976-A1 | COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MAT USA INC (US) | 2026-02-12 | — | — | US | claimed |
| US-12550694-B2 | Selective deposition for integrated circuit interconnect structures | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-02-10 | — | — | US | claimed |
| EP-4653506-A1 | CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2025-11-26 | — | — | EP | claimed |
| EP-4647474-A2 | CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A., Inc. (US) | 2025-11-12 | — | — | EP | claimed |
| EP-3766492-B1 | THIAZOLINE AND THIAZOLE COMPOUNDS FOR USE IN THE PROPHYLAXIS OR TREATMENT OF HYPOXIC INJURY OR ISCHEMIA-REPERFUSION INJURY | SCENT SCIENCE INT INC (JP) | 2025-10-15 | — | — | EP | claimed |
| EP-4626996-A1 | POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2025-10-08 | — | — | EP | claimed |
| US-20250302678-A1 | ABSORBENT ARTICLES INCLUDING PERFUME AND CYCLODEXTRINS | PROCTER & GAMBLE (US) | 2025-10-02 | — | — | US | claimed |
| US-4310459-A | Process for producing carbamoyl substituted penams and carbamoyl substituted cephams from penicillin sulfoxide esters | BRISTOL-MYERS COMPANY (US) | 1982-01-12 | — | — | US | claimed |
| US-4178180-A | Copper physical development using heterocyclic ligand copper (I) complexes | EASTMAN KODAK COMPANY (US) | 1979-12-11 | — | — | US | claimed |
| US-4156610-A | Copper physical development using heterocyclic ligand copper(I) complexes | EASTMAN KODAK COMPANY (US) | 1979-05-29 | — | — | US | claimed |
| US-4124386-A | Color diffusion transfer receiving layer comprising polymeric quaternary n-heterocyclic mordant | FUJI PHOTO FILM CO., LTD. (JP) | 1978-11-07 | — | — | US | claimed |
| US-4080493-A | POLYBUTADIENE, POLYISOPRENE, GELATION INHIBITOR | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1978-03-21 | — | — | US | claimed |
| US-3998894-A | DIMERIZATION AND CYCLIZATION OF A STYRENE AND A HAL GENO-STYRENE | BASF AKTIENGESELLSCHAFT (DT) | 1976-12-21 | — | — | US | claimed |
| US-3997348-A | FERRIC SALT BLEACHING SOLUTION | FUJI PHOTO FILM CO., LTD. (JA) | 1976-12-14 | — | — | US | claimed |
| US-3994733-A | CYANINE DYES, A BENZOTHIAZOLE, OR BENZOTHIAZOLONE, OR NAPHTHOTHIAZOLE, OR NAPHTHOTHIAZOLONE, OR A QUINOLONE | FUJI PHOTO FILM CO., LTD. (JA) | 1976-11-30 | — | — | US | claimed |
| US-3968099-A | Process for the preparation of azo dyestuffs containing cyano groups | BAYER AKTIENGESELLSCHAFT (DT) | 1976-07-06 | — | — | US | claimed |
| US-3943142-A | Dye intermediates and their preparation and use in the synthesis of methine dyes | EASTMAN KODAK COMPANY (US) | 1976-03-09 | — | — | US | claimed |