⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Butadiene SCHEMBL11197818 | 0.76 | — | — | |
| Butadiene SCHEMBL11480793 | 0.74 | TRPA1 (0.44) | — | |
| Butadiene SCHEMBL10457929 | 0.74 | TRPA1 (0.44) | — | |
| Butadiene SCHEMBL461643 | 0.74 | — | — | |
| Butadiene SCHEMBL250 | 0.74 | — | — | |
| Butadiene SCHEMBL11854764 | 0.74 | TRPA1 (0.44) | — | |
| Butadiene SCHEMBL11147748 | 0.74 | — | — | |
| Propene SCHEMBL11709400 | 0.74 | ALDH1A1 (0.33) | — | |
| Propene SCHEMBL11706357 | 0.74 | ALDH1A1 (0.33) | — | |
| Propene SCHEMBL126809 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020241501-A1 | CURABLE RESIN COMPOSITION AND CURED OBJECT OBTAINED THEREFROM | キヤノン株式会社 | 2020-12-03 | — | — | WO | disclosed |
| CN-110515270-A | The manufacture of photosensitive polymer combination, pattern forming method and optical semiconductor device | SHINETSU CHEMICAL CO | 2019-11-29 | — | — | CN | disclosed |
| EP-3341793-A1 | LIQUID, HYBRID UV/VIS RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | DSM IP Assets B.V. (NL) | 2018-07-04 | — | — | EP | disclosed |
| CN-104105760-B | Surface modified pigment and non-aqueous ink thereof | 爱克发印艺公司 | 2016-08-24 | — | — | CN | disclosed |
| CN-104105760-A | Surface modified pigment and non-aqueous ink thereof | AGFA GRAPHICS NV | 2014-10-15 | — | — | CN | disclosed |
| CN-101191027-A | Ink composition, two-pack curing ink composition set, and recording method and recorded matter using these | SEIKO EPSON CORP (JP) | 2008-06-04 | — | — | CN | disclosed |
| CN-101173127-A | Ink set | SEIKO EPSON CORP (JP) | 2008-05-07 | — | — | CN | disclosed |
| EP-1745935-A2 | Ink-jet recording device | Fuji Photo Film Co., Ltd. (JP) | 2007-01-24 | — | — | EP | disclosed |