⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL131936 | 0.80 | CA12 (0.32) | — | |
| SCHEMBL8385497 | 0.79 | — | — | |
| Methylethylamine SCHEMBL2390608 | 0.78 | EPHX1 (0.30) | — | |
| SCHEMBL8380351 | 0.76 | EPHX1 (0.39) | — | |
| Ethylenediamine SCHEMBL6036846 | 0.76 | DNM1 (0.30) | — | |
| Ethylamine SCHEMBL28061240 | 0.76 | DNM1 (0.30) | — | |
| Dimethylamine SCHEMBL2287524 | 0.75 | — | — | |
| SCHEMBL278782 | 0.75 | — | — | |
| SCHEMBL28319618 | 0.73 | — | — | |
| Propylamine SCHEMBL3969891 | 0.73 | DNM1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130099423-A1 | PHOTOCURABLE COMPOSITION FOR IMPRINT AND METHOD FOR FORMATION OF PATTERN USING THE COMPOSITION | TOKUYAMA CORPORATION (JP) | 2013-04-25 | — | — | US | disclosed |
| US-20130102734-A1 | PHOTOSEMICONDUCTOR PROTECTIVE MATERIAL AND PRECURSOR THEREOF, AND PROCESS FOR PRODUCING PHOTOSEMICONDUCTOR PROTECTIVE MATERIAL | DAICEL CORPORATION (JP) | 2013-04-25 | — | — | US | disclosed |
| EP-2562821-A1 | OPTICAL SEMICONDUCTOR PROTECTIVE MATERIAL, PRECURSOR FOR SAME, AND METHOD FOR MANUFACTURING OPTICAL SEMICONDUCTOR PROTECTIVE MATERIAL | Daicel Corporation (JP) | 2013-02-27 | — | — | EP | disclosed |
| US-7157147-B2 | Gas-barrier film and gas-barrier coating agent, and method for production thereof | TOKUYAMA CORPORATION (JP) | 2007-01-02 | — | — | US | disclosed |
| US-20040253463-A1 | Gas-barrier film and gas-barrier coating agent, and method for production thereof | TOKUYAMA CORPORATION (JP) | 2004-12-16 | — | — | US | disclosed |
| EP-1428657-A1 | GAS-BARRIER FILM AND GAS-BARRIER COATING AGENT, AND METHOD FOR PRODUCTION THEREOF | Tokuyama Corporation (JP) | 2004-06-16 | — | — | EP | disclosed |
| US-20020197480-A1 | Gas-barrier material, gas-barrier film and method for manufacturing the same | TOKUYAMA CORPORATION (JP) | 2002-12-26 | — | — | US | disclosed |