Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14651382 | 0.85 | SMN1; SMN2 (0.35) | — | |
| SCHEMBL5599002 | 0.80 | — | — | |
| SCHEMBL12722834 | 0.77 | — | — | |
| SCHEMBL464628 | 0.77 | — | — | |
| SCHEMBL2738310 | 0.77 | — | — | |
| SCHEMBL22272168 | 0.76 | POLB (0.34) | — | |
| SCHEMBL12014331 | 0.75 | ALDH1A1 (0.38) | KDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL7657725 | 0.74 | NLRP3 (0.41) | KDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL576482 | 0.74 | — | — | |
| SCHEMBL29152239 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8568956-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-29 | — | — | US | disclosed |
| EP-1882981-B1 | POSITIVE-WORKING RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO LTD (JP) | 2012-12-19 | — | — | EP | disclosed |
| US-20120219899-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| US-7858286-B2 | Positive resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-28 | — | — | US | disclosed |
| US-7858286-B2 | Positive resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-12-28 | — | — | US | disclosed |
| US-7803512-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-09-28 | — | — | US | disclosed |
| US-7803512-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-09-28 | — | — | US | disclosed |
| US-7781144-B2 | Positive resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-24 | — | — | US | disclosed |
| US-7781144-B2 | Positive resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-24 | — | — | US | disclosed |
| US-7645559-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-01-12 | — | — | US | disclosed |
| US-20090098483-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHA KOGYO CO., LTD. (JP) | 2009-04-16 | — | — | US | disclosed |
| US-20090068588-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-12 | — | — | US | disclosed |
| US-20090068588-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-12 | — | — | US | disclosed |
| US-20090035698-A1 | POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20090035698-A1 | POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20080096126-A1 | Polymer Compound, Positive Resist Composition and Process for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-04-24 | — | — | US | disclosed |
| US-20080096126-A1 | Polymer Compound, Positive Resist Composition and Process for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-04-24 | — | — | US | disclosed |
| EP-1882981-A1 | POSITIVE-WORKING RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-01-30 | — | — | EP | disclosed |
| EP-1756172-A2 | COMPONENTS AND CATALYSTS FOR THE POLYMERIZATION OF OLEFINS | Basell Poliolefine Italia S.r.l. (IT) | 2007-02-28 | — | — | EP | disclosed |
| WO-2005123784-A2 | COMPONENTS AND CATALYSTS FOR THE POLYMERIZATION OF OLEFINS | BASELL POLIOLEFINE ITALIA S.R.L. (IT) | 2005-12-29 | — | — | WO | disclosed |