Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RELA | Q04206 | 1/20 | 0.63 |
| ▸ | NQO1 | P15559 | 1/20 | 0.56 |
| ▸ | ESR1 | P03372 | 2/20 | 0.56 |
| ▸ | AHR | P35869 | 1/20 | 0.56 |
| ▸ | NPC1 | O15118 | 3/20 | 0.53 |
| ▸ | RAB9A | P51151 | 3/20 | 0.53 |
| ▸ | MAPT | P10636 | 2/20 | 0.53 |
| ▸ | TP53 | P04637 | 1/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.53 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.53 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.51 |
| ▸ | TUBB | P07437 | 1/20 | 0.51 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.51 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.51 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.51 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.51 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.51 |
| ▸ | TUBB2A | Q13885 | 1/20 | 0.51 |
| ▸ | TUBB8 | Q3ZCM7 | 1/20 | 0.51 |
| ▸ | TUBA3E | Q6PEY2 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7270826 | 0.87 | RELA (0.58) | RELANQO1ESR1AHRNPC1 | |
| SCHEMBL10623834 | 0.85 | RELA (0.83) | RELANQO1ESR1AHRNPC1 | |
| SCHEMBL10623831 | 0.85 | RELA (0.83) | RELANQO1ESR1AHRNPC1 | |
| SCHEMBL8199822 | 0.81 | RELA (0.51) | RELANQO1ESR1AHRNPC1 | |
| SCHEMBL2622560 | 0.81 | RELA (0.70) | RELANQO1ESR1AHRNPC1 | |
| SCHEMBL7543934 | 0.79 | RELA (0.58) | RELANQO1ESR1AHRNPC1 | |
| SCHEMBL4270558 | 0.79 | RELA (0.47) | RELANPC1RAB9AMAPTSMN1; SMN2 | |
| SCHEMBL13267808 | 0.79 | RELA (0.74) | RELANQO1ESR1AHRNPC1 | |
| SCHEMBL18911077 | 0.79 | RELA (0.68) | RELANQO1ESR1AHRNPC1 | |
| SCHEMBL10601861 | 0.79 | RELA (0.68) | RELANQO1ESR1AHRNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103376649-A | Radioactivity sensitive composition, interlayer insulating film for display element, and forming method thereof | JSR CORP | 2013-10-30 | — | — | CN | disclosed |
| CN-101876789-B | Positive photo-sensitive resin composition and solidification film forming method using same | FUJIFILM | 2013-10-30 | — | — | CN | disclosed |
| CN-101876791-B | Positive photo-resist resin composition and solidification film forming method using the composition | FUJIFILM | 2013-06-12 | — | — | CN | disclosed |
| US-7297463-B2 | Photosensitive polymer and chemically amplified photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-11-20 | — | — | US | disclosed |
| US-20060188812-A1 | Phenolic hydroxyl group-containing copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-08-24 | — | — | US | disclosed |
| EP-1693707-A1 | Positive resist composition, and patterning process using the same | Shinetsu Chemical Co., Ltd. (JP) | 2006-08-23 | — | — | EP | disclosed |
| CN-1821879-A | Positive resist composition, manufacture method and application of the same | SHINETSU CHEMICAL CO (JP) | 2006-08-23 | — | — | CN | disclosed |
| US-20060183051-A1 | Positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-08-17 | — | — | US | disclosed |
| EP-1686424-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2006-08-02 | — | — | EP | disclosed |
| US-20060166138-A1 | Radiation-sensitive resin composition | JSR CORPORATION | 2006-07-27 | — | — | US | disclosed |
| US-20050271977-A1 | Photosensitive polymer and chemically amplified photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2005-12-08 | — | — | US | disclosed |
| US-6358665-B1 | ONIUM SALT PRECURSOR FOR GENERATING FLUOROALKYLSULFONATE | CLARIANT INTERNATIONAL LTD. (CH) | 2002-03-19 | — | — | US | disclosed |
| EP-1033624-A1 | RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE | Clariant International Ltd. (CH) | 2000-09-06 | — | — | EP | disclosed |