Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RELA | Q04206 | 1/20 | 0.58 |
| ▸ | ESR1 | P03372 | 2/20 | 0.51 |
| ▸ | AHR | P35869 | 1/20 | 0.51 |
| ▸ | NQO1 | P15559 | 1/20 | 0.50 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.49 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.49 |
| ▸ | NPC1 | O15118 | 3/20 | 0.49 |
| ▸ | RAB9A | P51151 | 3/20 | 0.49 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | TP53 | P04637 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.49 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.47 |
| ▸ | TUBB | P07437 | 1/20 | 0.47 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.47 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.47 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.47 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.47 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.47 |
| ▸ | TUBB2A | Q13885 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10623831 | 0.80 | RELA (0.83) | RELAESR1AHRNQO1NPC1 | |
| SCHEMBL10623834 | 0.80 | RELA (0.83) | RELAESR1AHRNQO1NPC1 | |
| SCHEMBL5023790 | 0.80 | KDM4E (0.56) | RELAESR1AHRTP53SMN1; SMN2 | |
| SCHEMBL5026274 | 0.79 | KDM4E (0.55) | RELAESR1AHRNPC1RAB9A | |
| SCHEMBL5604535 | 0.79 | RELA (0.63) | RELAESR1AHRNQO1NPC1 | |
| SCHEMBL2622560 | 0.77 | RELA (0.70) | RELAESR1AHRNQO1NPC1 | |
| SCHEMBL7270826 | 0.75 | RELA (0.58) | RELAESR1AHRNQO1NPC1 | |
| SCHEMBL13476090 | 0.75 | RELA (0.58) | RELAESR1AHRNQO1TAS1R3 | |
| SCHEMBL10601861 | 0.75 | RELA (0.68) | RELAESR1AHRNQO1NPC1 | |
| SCHEMBL10601858 | 0.75 | RELA (0.68) | RELAESR1AHRNQO1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20020015906-A1 | Polymer for photoresist, method of production thereof and photoresist composition containing polymer | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-02-07 | — | — | US | disclosed |
| EP-0520642-B1 | Resist material and pattern formation process | WAKO PURE CHEM IND LTD (JP) | 1998-10-28 | — | — | EP | disclosed |
| US-5670299-A | COATING A PHOTORESISTS POLYMER ON A SUBSTRATE, DEVELOPMENT AND HEAT TREATMENT | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-09-23 | — | — | US | disclosed |
| US-5468589-A | Heat resistant, photosensitive patterns | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1995-11-21 | — | — | US | disclosed |
| EP-0520642-A1 | Resist material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1992-12-30 | — | — | EP | disclosed |