Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Propylene Glycol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.67 |
| ▸ | TSHR | P16473 | 6/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 4/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | USP2 | O75604 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylene Glycol SCHEMBL20478 | 0.93 | — | — | |
| Propylene Glycol SCHEMBL8081763 | 0.93 | TDP1 (0.77) | TDP1TSHRALDH1A1HSD17B10LMNA | |
| Propylene Glycol SCHEMBL8072957 | 0.93 | TDP1 (0.77) | TDP1TSHRALDH1A1HSD17B10LMNA | |
| Propylene Glycol SCHEMBL28302926 | 0.93 | TDP1 (0.77) | TDP1TSHRALDH1A1HSD17B10LMNA | |
| Propylene Glycol SCHEMBL27529046 | 0.90 | — | — | |
| Propylene Glycol SCHEMBL600550 | 0.89 | — | — | |
| Propylene Glycol SCHEMBL28349323 | 0.89 | TDP1 (0.83) | TDP1TSHRALDH1A1HSD17B10LMNA | |
| Propylene Glycol SCHEMBL988548 | 0.89 | TDP1 (0.83) | TDP1TSHRALDH1A1HSD17B10LMNA | |
| Propylene Glycol SCHEMBL28321892 | 0.87 | TDP1 (0.67) | TDP1TSHRALDH1A1HSD17B10LMNA | |
| Propylene Glycol SCHEMBL2481279 | 0.87 | TDP1 (0.50) | TDP1TSHRALDH1A1HSD17B10LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240111217-A1 | METHOD FOR DIRECTED SELF-ASSEMBLY LITHOGRAPHY | INSTITUT POLYTECHNIQUE DE BORDEAUX (FR) | 2024-04-04 | — | — | US | disclosed |
| CN-114600044-A | Directional self-assembly photoetching method | 阿科玛法国公司 | 2022-06-07 | — | — | CN | disclosed |
| US-8927681-B2 | Coating composition for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-01-06 | — | — | US | disclosed |
| US-20120034562-A1 | COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST | WAYTON GERALD B (US) | 2012-02-09 | — | — | US | disclosed |
| US-7582360-B2 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-09-01 | — | — | US | disclosed |
| US-20070092746-A1 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | SHIPLEY COMPANY, L.L.C. (US) | 2007-04-26 | — | — | US | disclosed |
| US-7163751-B2 | spin-on antireflective coating compositions that contain an aromatic polyester resin and a solvent comprising an oxyisobutyric acid ester, especially methyl-2-hydroxyisobutyrate; | SHIPLEY COMPANY, L.L.C. (US) | 2007-01-16 | — | — | US | disclosed |
| US-6852421-B2 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-08 | — | — | US | disclosed |
| US-20040209200-A1 | spin-on antireflective coating compositions that contain an aromatic polyester resin and a solvent comprising an oxyisobutyric acid ester, especially methyl-2-hydroxyisobutyrate; | SHIPLEY COMPANY, L.L.C. | 2004-10-21 | — | — | US | disclosed |
| US-20030180559-A1 | Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images | SHIPLEY COMPANY, L.L.C. | 2003-09-25 | — | — | US | disclosed |
| EP-1298492-A2 | Coating compositions for use with an overcoated photoresist | Shipley Co. L.L.C. (US) | 2003-04-02 | — | — | EP | disclosed |
| EP-1298493-A2 | Coating compositions for use with an overcoated photoresist | Shipley Company LLC (US) | 2003-04-02 | — | — | EP | disclosed |