SCHEMBL5608375

SCHEMBL5608375

COC(=O)OC12CC3CC(CC(O)(C3)C1)C2

nearest known ligand 0.42

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.39
ALDH1A1 P00352 1/20 0.38
HSD11B1 P28845 2/20 0.37
DPP4 P27487 2/20 0.37
CNR1 P21554 2/20 0.36
CNR2 P34972 2/20 0.36
ABL1 P00519 1/20 0.36
TSHR P16473 1/20 0.36
RIN1 Q13671 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
NPSR1 Q6W5P4 1/20 0.35
DPP8 Q6V1X1 1/20 0.35
DPP9 Q86TI2 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5608031 0.89 NPSR1 (0.39) ALDH1A1TSHRNPSR1
SCHEMBL5607961 0.84 DPP4 (0.34) DPP4
SCHEMBL5608441 0.84 DPP4 (0.31) DPP4
SCHEMBL15449150 0.83 TSHR (0.45) ALDH1A1TSHRNPSR1
SCHEMBL1696580 0.83 DPP4 (0.41) ALDH1A1DPP4TSHRNPSR1
SCHEMBL18469162 0.83 DPP4 (0.41) ALDH1A1DPP4TSHRNPSR1
SCHEMBL5607853 0.82 PKM (0.41) PKMALDH1A1HSD11B1DPP4NPSR1
SCHEMBL9925262 0.81 CYP17A1 (0.38) PKMALDH1A1HSD11B1DPP4L3MBTL1
SCHEMBL5607937 0.81 DPP8 (0.39) PKMALDH1A1HSD11B1DPP4CNR1
SCHEMBL14389481 0.81 CYP17A1 (0.38) PKMALDH1A1HSD11B1DPP4L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9223205-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-29 US disclosed
US-9122155-B2 Sulfonium salt, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-09-01 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-20130236832-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-09-12 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed
US-RE39744-E1 Adamantane derivatives and process for producing them DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-07-24 US disclosed
US-6392104-B1 CHEMICAL INTERMEDIATES FOR DRUGS, AGRICULTURE DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2002-05-21 US disclosed
EP-0927711-A1 ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THEM Daicel Chemical Industries, Ltd. (JP) 1999-07-07 EP disclosed