Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 1/20 | 0.38 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.38 |
| ▸ | PKM | P14618 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.36 |
| ▸ | DPP4 | P27487 | 3/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14389481 | 1.00 | CYP17A1 (0.38) | CYP17A1CYP19A1PKML3MBTL1ALDH1A1 | |
| SCHEMBL18469143 | 0.87 | CYP17A1 (0.36) | CYP17A1CYP19A1PKML3MBTL1ALDH1A1 | |
| SCHEMBL12897861 | 0.87 | CYP17A1 (0.36) | CYP17A1CYP19A1PKML3MBTL1ALDH1A1 | |
| SCHEMBL23417222 | 0.87 | DPP4 (0.40) | CYP17A1CYP19A1PKML3MBTL1ALDH1A1 | |
| SCHEMBL12705073 | 0.87 | CYP17A1 (0.36) | CYP17A1CYP19A1PKML3MBTL1ALDH1A1 | |
| SCHEMBL11931639 | 0.85 | DPP4 (0.33) | CYP17A1CYP19A1DPP4 | |
| SCHEMBL106291 | 0.84 | HSD11B1 (0.38) | CYP17A1CYP19A1PKML3MBTL1ALDH1A1 | |
| SCHEMBL19400628 | 0.84 | CYP17A1 (0.35) | CYP17A1CYP19A1PKML3MBTL1ALDH1A1 | |
| SCHEMBL18455670 | 0.84 | CYP17A1 (0.35) | CYP17A1CYP19A1PKML3MBTL1ALDH1A1 | |
| SCHEMBL12256166 | 0.83 | PKM (0.38) | CYP17A1CYP19A1PKML3MBTL1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
| CN-113444559-B | Battery foil rolling additive and preparation method and application thereof | 奎克化学（中国）有限公司 | 2023-03-21 | — | — | CN | disclosed |
| US-11327399-B2 | Photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2022-05-10 | — | — | US | disclosed |
| CN-113444559-A | Battery foil rolling additive and preparation method and application thereof | 奎克化学（中国）有限公司 | 2021-09-28 | — | — | CN | disclosed |
| US-10915022-B2 | Photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-02-09 | — | — | US | disclosed |
| US-20200354595-A1 | AQUEOUS INK COMPOSITION, INK SET, AND IMAGE-FORMING METHOD | FUJIFILM CORPORATION (JP) | 2020-11-12 | — | — | US | disclosed |
| US-20200326625-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-10-15 | — | — | US | disclosed |
| US-10781198-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-22 | — | — | US | disclosed |
| US-10747111-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-08-18 | — | — | US | disclosed |
| US-8148044-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-04-03 | — | — | US | disclosed |
| US-20110244394-A1 | METHOD FOR PRODUCING RESIN SOLUTION FOR PHOTORESIST, PHOTORESIST COMPOSITION, AND PATTERN-FORMING METHOD | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20100310991-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-09 | — | — | US | disclosed |
| US-20100297553-A1 | POSITIVE RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100167178-A1 | Oxime sulfonates and the use thereof as latent acids | YAMATO HITOSHI | 2010-07-01 | — | — | US | disclosed |
| US-20100136479-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-06-03 | — | — | US | disclosed |
| US-20100081086-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-01 | — | — | US | disclosed |
| US-20100081086-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-01 | — | — | US | disclosed |
| US-7531287-B2 | Suitable to liquid immersion exposure capable of suppressing the formation of development defects and scums, with preferably less leaching of resist ingredients to the liquid immersion solution upon pattern formation by liquid immersion exposure | FUJIFILM CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-7531287-B2 | Suitable to liquid immersion exposure capable of suppressing the formation of development defects and scums, with preferably less leaching of resist ingredients to the liquid immersion solution upon pattern formation by liquid immersion exposure | FUJIFILM CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200326625-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST PATTERN | HAX1, BRIX1, RXRA | CYP17A1 2867/4885CYP19A1 990/4885PKM 2538/4885 |
| US-10781198-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | RER1, BRIX1, NR2E3 | CYP17A1 1268/4885CYP19A1 557/4885PKM 3110/4885 |
| US-20100167178-A1 | Oxime sulfonates and the use thereof as latent acids | HAO2, SULT2A1, ARSA | CYP17A1 1042/4885CYP19A1 216/4885PKM 3185/4885 |
| US-10747111-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | HAX1, BRIX1, RXRA | CYP17A1 2867/4885CYP19A1 990/4885PKM 2538/4885 |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | HAX1, BRIX1, RXRA | CYP17A1 2867/4885CYP19A1 990/4885PKM 2538/4885 |
| US-20100136479-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | AFF1, F12, AFF2 | CYP17A1 2939/4885CYP19A1 1755/4885PKM 3229/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.