Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | TSHR | P16473 | 3/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29316638 | 0.94 | ALDH1A1 (0.33) | ALDH1A1TSHRSMN1; SMN2LMNAHSD17B10 | |
| SCHEMBL11805474 | 0.94 | ALDH1A1 (0.33) | ALDH1A1TSHRSMN1; SMN2LMNAHSD17B10 | |
| SCHEMBL1053504 | 0.91 | TSHR (0.37) | ALDH1A1TSHRSMN1; SMN2 | |
| SCHEMBL1101582 | 0.88 | ALDH1A1 (0.37) | ALDH1A1TSHRSMN1; SMN2LMNAHSD17B10 | |
| SCHEMBL14678840 | 0.88 | ALDH1A1 (0.37) | ALDH1A1TSHRSMN1; SMN2LMNAHSD17B10 | |
| SCHEMBL5665833 | 0.87 | — | — | |
| SCHEMBL39090 | 0.84 | TSHR (0.37) | ALDH1A1TSHRSMN1; SMN2 | |
| SCHEMBL4530110 | 0.84 | TSHR (0.37) | ALDH1A1TSHRSMN1; SMN2 | |
| SCHEMBL409753 | 0.84 | TSHR (0.41) | ALDH1A1TSHR | |
| SCHEMBL1100793 | 0.82 | ALDH1A1 (0.33) | ALDH1A1TSHRSMN1; SMN2LMNAHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1915411-A1 | NEW ORGANIC BOTTOM ANTIREFLECTIVE POLYMER COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2008-04-30 | — | — | EP | claimed |
| US-20070020557-A1 | New organic bottom antireflective polymer compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2007-01-25 | — | — | US | claimed |
| WO-2007010385-A1 | NEW ORGANIC BOTTOM ANTIREFLECTIVE POLYMER COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-01-25 | — | — | WO | claimed |
| US-20250231491-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| US-20250231492-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| CN-119816784-A | Fabrication of integrated circuits using positive photo-patternable dielectrics comprising high silicon content polysilsesquioxanes | 潍坊星泰克微电子材料有限公司 | 2025-04-11 | — | — | CN | disclosed |
| CN-119631021-A | Photolithography method using silicon photoresist | 潍坊星泰克微电子材料有限公司 | 2025-03-14 | — | — | CN | disclosed |
| EP-4508495-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | Suntific Materials (Weifang), Ltd. (CN) | 2025-02-19 | — | — | EP | disclosed |
| EP-4508493-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | Suntific Materials (Weifang), Ltd. (CN) | 2025-02-19 | — | — | EP | disclosed |
| WO-2025000537-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | SUNTIFIC MATERIALS (WEIFANG), LTD. (CN) | 2025-01-02 | — | — | WO | disclosed |
| WO-2025000535-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG), LTD. (CN) | 2025-01-02 | — | — | WO | disclosed |
| US-20020198297-A1 | Polyester and polyamide compositions of low residual aldehyde content | ODORISIO PAUL A (US) | 2002-12-26 | — | — | US | disclosed |
| CN-1375522-A | Polyester and polyamide composition with low residual aldehyde content | CIBA SC HOLDING AG (CH) | 2002-10-23 | — | — | CN | disclosed |
| US-20020137856-A1 | Polyester compositions of low residual aldehyde content | CIBA SPECIALTY CHEMICALS CORP. | 2002-09-26 | — | — | US | disclosed |
| EP-1239006-A1 | Polyester and polyamide compositions of low residual aldehyde content | Ciba SC Holding AG (CH) | 2002-09-11 | — | — | EP | disclosed |
| US-5681879-A | BLEND OF POLYESTER, POLYHYDRIC ALCOHOL, SYNERGISTIC MIXTURE OF INORGANIC AND HALOGEN FLAME RETARDERS | MITSUBISHI CHEMICAL CORPORATION (JP) | 1997-10-28 | — | — | US | disclosed |
| EP-0691370-A2 | Flame-retardant polyester resin composition | Mitsubishi Chemical Corporation (JP) | 1996-01-10 | — | — | EP | disclosed |
| US-4985582-A | CHEMICAL INTERMEDIATES FOR BICYCLIC RING COMPOUNDS HAVING MULTIPLE SULFUR ATOMS IN THE RING SYSTEM | THE WELLCOME FOUNDATION LTD. (GB) | 1991-01-15 | — | — | US | disclosed |
| EP-0216625-A2 | Pesticidal compounds | THE WELLCOME FOUNDATION LIMITED (GB) | 1987-04-01 | — | — | EP | disclosed |
| EP-0208856-A2 | Contact adhesive with radiation-hardenable polyesters containing (meth-)acryl groups | HÜLS AKTIENGESELLSCHAFT (DE) | 1987-01-21 | — | — | EP | disclosed |