⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6367480 | 0.65 | PTPN1 (0.34) | — | |
| SCHEMBL14018841 | 0.65 | — | — | |
| SCHEMBL11989209 | 0.61 | — | — | |
| SCHEMBL14944214 | 0.61 | — | — | |
| SCHEMBL14466001 | 0.61 | — | — | |
| SCHEMBL9913265 | 0.61 | — | — | |
| SCHEMBL11201963 | 0.60 | PTPN1 (0.31) | — | |
| SCHEMBL12018906 | 0.58 | MAPK1 (0.31) | — | |
| SCHEMBL7852314 | 0.56 | — | — | |
| SCHEMBL7852310 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7169541-B2 | Compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-30 | — | — | US | disclosed |
| US-20050014092-A1 | Novel compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-01-20 | — | — | US | disclosed |