⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14466001 | 1.00 | — | — | |
| SCHEMBL14944214 | 1.00 | — | — | |
| SCHEMBL19068530 | 0.81 | — | — | |
| SCHEMBL5521764 | 0.64 | ICAM1 (0.36) | — | |
| SCHEMBL15856361 | 0.63 | PTPN1 (0.31) | — | |
| SCHEMBL5621274 | 0.61 | — | — | |
| SCHEMBL6367480 | 0.61 | PTPN1 (0.34) | — | |
| SCHEMBL13865302 | 0.58 | — | — | |
| SCHEMBL19888508 | 0.58 | ALDH1A1 (0.32) | — | |
| SCHEMBL24831854 | 0.56 | CYP19A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1975705-B1 | Positive resist composition and pattern-forming method | FUJIFILM CORP (JP) | 2016-04-27 | — | — | EP | disclosed |
| EP-2194073-B1 | Positive-working photosensitive composition, method for pattern formation using the composition, resin for use in the composition, and monomer. | FUJIFILM CORP (JP) | 2013-06-05 | — | — | EP | disclosed |
| WO-2013065878-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR CROSSLINKED LAYER FORMATION TO BE USED IN THE METHOD | FUJIFILM CORPORATION (JP) | 2013-05-10 | — | — | WO | disclosed |
| WO-2012133257-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2012-10-04 | — | — | WO | disclosed |
| WO-2012074122-A1 | NEGATIVE PATTERN FORMING METHOD AND RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2012-06-07 | — | — | WO | disclosed |
| WO-2012036315-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2012-03-22 | — | — | WO | disclosed |
| WO-2012008510-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-19 | — | — | WO | disclosed |
| WO-2011162408-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-12-29 | — | — | WO | disclosed |
| WO-2011149035-A1 | PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-12-01 | — | — | WO | disclosed |
| EP-1906238-B1 | Photosensitive composition and pattern forming method using the same | FUJIFILM CORP (JP) | 2011-11-09 | — | — | EP | disclosed |
| WO-2011118824-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-09-29 | — | — | WO | disclosed |
| WO-2011108767-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2011-09-09 | — | — | WO | disclosed |
| WO-2011105626-A1 | PATTERN FORMING METHOD AND RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-09-01 | — | — | WO | disclosed |
| WO-2011102546-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-08-25 | — | — | WO | disclosed |
| WO-2011087144-A1 | PATTERN FORMING METHOD, PATTERN, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-07-21 | — | — | WO | disclosed |
| WO-2011043481-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2011-04-14 | — | — | WO | disclosed |
| WO-2011024734-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-03-03 | — | — | WO | disclosed |
| WO-2010114176-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | WO | disclosed |
| WO-2009113735-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-09-17 | — | — | WO | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |