SCHEMBL562772

SCHEMBL562772

O=C(O)C(=Cc1ccccc1)CC(F)(F)F

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.58
CYP2C9 P11712 1/20 0.58
RECQL P46063 1/20 0.47
AKR1C3 P42330 1/20 0.46
AKR1C1 Q04828 1/20 0.44
S1PR4 O95977 2/20 0.43
ALDH1A1 P00352 2/20 0.43
LMNA P02545 2/20 0.43
MAPT P10636 2/20 0.43
S1PR1 P21453 2/20 0.43
NPSR1 Q6W5P4 2/20 0.43
MME P08473 2/20 0.41
EPHX2 P34913 2/20 0.41
PPARG P37231 1/20 0.41
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
TP53 P04637 1/20 0.39
HTT P42858 1/20 0.39
TBXAS1 P24557 2/20 0.38
OPRK1 P41145 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28605792 1.00 CYP3A4 (0.58) CYP3A4CYP2C9RECQLAKR1C3AKR1C1
SCHEMBL31303946 0.84 CYP3A4 (0.53) CYP3A4CYP2C9RECQLAKR1C3AKR1C1
SCHEMBL28609137 0.82 RECQL (0.49) CYP3A4CYP2C9RECQLAKR1C3MAPT
SCHEMBL28609135 0.82 RECQL (0.49) CYP3A4CYP2C9RECQLAKR1C3MAPT
SCHEMBL491485 0.81 CYP3A4 (0.58) CYP3A4CYP2C9RECQLAKR1C3AKR1C1
SCHEMBL560552 0.79 CYP3A4 (0.63) CYP3A4CYP2C9RECQLAKR1C3AKR1C1
SCHEMBL3907078 0.77 CYP3A4 (0.53) CYP3A4CYP2C9RECQLAKR1C3AKR1C1
SCHEMBL5913037 0.76 CYP3A4 (0.66) CYP3A4CYP2C9RECQLAKR1C3AKR1C1
SCHEMBL7101790 0.76 CYP3A4 (0.66) CYP3A4CYP2C9RECQLAKR1C3AKR1C1
SCHEMBL261986 0.76 CYP3A4 (0.66) CYP3A4CYP2C9RECQLAKR1C3AKR1C1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113200856-B Trifluoromethyl propylene compound and preparation method and application thereof 南京工业大学 2022-06-07 CN disclosed
CN-113200856-A Trifluoromethyl propylene compound and preparation method and application thereof 南京工业大学 2021-08-03 CN disclosed
US-8609318-B2 Radiation-sensitive resin composition, method for forming resist pattern and polymer JSR CORPORATION (JP) 2013-12-17 US disclosed
US-20120034560-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER JSR CORPORATION (JP) 2012-02-09 US disclosed