SCHEMBL562823

SCHEMBL562823

O=C(O)C(=CC1CC2CCC1C2)CF

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.39
ABAT P80404 1/20 0.35
ATM Q13315 1/20 0.34
TAS1R3 Q7RTX0 1/20 0.33
TAS1R1 Q7RTX1 1/20 0.33
TAS1R2 Q8TE23 1/20 0.33
MEN1 O00255 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
KMT2A Q03164 1/20 0.33
HPGD P15428 3/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
EPHX2 P34913 2/20 0.32
EPHX1 P07099 1/20 0.31
ALDH1A1 P00352 1/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6396833 0.85 POLB (0.40) POLBATMMEN1NPC1RAB9A
SCHEMBL703642 0.83 POLB (0.42) POLBATMMEN1NPC1RAB9A
SCHEMBL245976 0.83 POLB (0.42) POLBATMTAS1R3TAS1R1TAS1R2
SCHEMBL158980 0.74 POLB (0.41) POLBATMMEN1NPC1RAB9A
SCHEMBL30730747 0.70 POLB (0.40) POLBATMHPGDALDH1A1MAPT
SCHEMBL7708642 0.70 POLB (0.39) POLBATMHPGDEPHX2ALDH1A1
SCHEMBL245018 0.70 POLB (0.39) POLBATMMEN1NPC1RAB9A
SCHEMBL3248433 0.70 POLB (0.36) POLBATMMEN1NPC1RAB9A
SCHEMBL126306 0.69 ATM (0.50) POLBATMMEN1NPC1RAB9A
SCHEMBL32688502 0.69 POLB (0.41) POLBATMTAS1R3TAS1R1TAS1R2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9465291-B2 Radiation-sensitive resin composition, polymer, compound, and method for producing compound JSR CORPORATION (JP) 2016-10-11 US disclosed
US-20140186771-A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND JSR CORPORATION (JP) 2014-07-03 US disclosed
US-8609318-B2 Radiation-sensitive resin composition, method for forming resist pattern and polymer JSR CORPORATION (JP) 2013-12-17 US disclosed
US-20120034560-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER JSR CORPORATION (JP) 2012-02-09 US disclosed