Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 3/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6396833 | 0.85 | POLB (0.40) | POLBMEN1NPC1RAB9AKMT2A | |
| SCHEMBL245976 | 0.83 | POLB (0.42) | POLBMEN1NPC1RAB9AKMT2A | |
| SCHEMBL562823 | 0.83 | POLB (0.39) | POLBMEN1NPC1RAB9AKMT2A | |
| SCHEMBL158980 | 0.74 | POLB (0.41) | POLBTSHRMEN1NPC1RAB9A | |
| SCHEMBL27647416 | 0.72 | POLB (0.50) | POLBKDM4EMEN1NPC1RAB9A | |
| SCHEMBL32689195 | 0.70 | POLB (0.41) | POLBKDM4EMEN1NPC1RAB9A | |
| SCHEMBL7708642 | 0.70 | POLB (0.39) | POLBEPHX2HPGDATMALDH1A1 | |
| SCHEMBL245018 | 0.70 | POLB (0.39) | POLBKDM4EMEN1NPC1RAB9A | |
| SCHEMBL3248433 | 0.70 | POLB (0.36) | POLBMEN1NPC1RAB9AKMT2A | |
| SCHEMBL126306 | 0.69 | ATM (0.50) | POLBMEN1NPC1RAB9AKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8808974-B2 | Method for forming pattern | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8431324-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-8182977-B2 | Polymer and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-8124314-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20110151378-A1 | RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| US-7956142-B2 | Polymerizable sulfonic acid onium salt and resin | JSR CORPORATION (JP) | 2011-06-07 | — | — | US | disclosed |
| US-7897821-B2 | Sulfonium compound | JSR CORPORATION (JP) | 2011-03-01 | — | — | US | disclosed |
| US-20110040056-A1 | PROCESS FOR PRODUCTION OF POLYMER | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2011-02-17 | — | — | US | disclosed |
| US-20100324329-A1 | COMPOUND | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100068650-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION | JSR CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | JSR CORPORATION (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20070254247-A1 | Radiation-sensitive resin composition | YAMAMOTO MASAFUMI | 2007-11-01 | — | — | US | disclosed |
| US-7005230-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-02-28 | — | — | US | disclosed |
| US-6921623-B2 | Active components and photosensitive resin composition containing the same | KRI, INC. (JP) | 2005-07-26 | — | — | US | disclosed |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | KRI, INC. (JP) | 2003-11-13 | — | — | US | disclosed |
| US-20030064320-A1 | Active components and photosensitive resin composition containing the same | KRI, INC. (JP) | 2003-04-03 | — | — | US | disclosed |
| US-6287746-B1 | PHOTOACID GENERATOR | NEC CORPORATION (JP) | 2001-09-11 | — | — | US | disclosed |
| US-6030747-A | CHEMICALLY AMPLIFIED RESIST CONSISTS OF A PHOTOACID GENERATOR, A CROSSLINKING AGENT ACTIVATED IN PRESENCE OF ACID AND A COPOLYMER OF ACRYLIC OR METHACRYLIC ESTER CONTAINING AN ACID, HYDROXY OR ESTER POLAR GROUP AND A COMPOUND | NEC CORPORATION (JP) | 2000-02-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100063232-A1 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN | ASIC1, RER1, RPS10 | POLB 1553/4885KDM4E 3349/4885TSHR 941/4885 |
| US-20100324329-A1 | COMPOUND | AFF2, AFF1, AFF4 | POLB 1732/4885KDM4E 3442/4885TSHR 890/4885 |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | ARCN1, RAD51, PAM | POLB 2346/4885KDM4E 1317/4885TSHR 4402/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.