SCHEMBL563247

SCHEMBL563247

O=C(O)C(=Cc1cccc2ccccc12)C(C(F)(F)F)C(F)(F)F

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.48
ALDH1A1 P00352 3/20 0.44
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
MAPT P10636 2/20 0.44
HPGD P15428 2/20 0.44
GAA P10253 2/20 0.44
CRHBP P24387 1/20 0.44
HTT P42858 1/20 0.44
CRHR2 Q13324 1/20 0.44
HDAC8 Q9BY41 1/20 0.40
HDAC6 Q9UBN7 1/20 0.40
SMPD2 O60906 2/20 0.39
MTNR1A P48039 1/20 0.39
MTNR1B P49286 1/20 0.39
F2 P00734 1/20 0.38
LMNA P02545 1/20 0.38
GRIK1 P39086 1/20 0.38
GRIK2 Q13002 1/20 0.38
NR4A1 P22736 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL563758 0.83 KDM4E (0.51) KDM4EALDH1A1MEN1KMT2AMAPT
SCHEMBL563363 0.76 AKR1C3 (0.46) KDM4EALDH1A1MEN1KMT2AMAPT
SCHEMBL28492926 0.74 KDM4E (0.55) KDM4EALDH1A1MEN1KMT2AMAPT
SCHEMBL7189395 0.74 KDM4E (0.71) KDM4EALDH1A1MEN1KMT2AMAPT
SCHEMBL563843 0.73 KDM4E (0.48) KDM4EALDH1A1MEN1KMT2AMAPT
SCHEMBL6524361 0.72 KDM4E (0.47) KDM4EALDH1A1MEN1KMT2AMAPT
SCHEMBL6516609 0.71 KDM4E (0.49) KDM4EALDH1A1MEN1KMT2AMAPT
SCHEMBL36974 0.71 KDM4E (0.68) KDM4EALDH1A1MEN1KMT2AMAPT
SCHEMBL7436213 0.71 KDM4E (0.55) KDM4EALDH1A1MEN1KMT2AMAPT
SCHEMBL7436220 0.71 KDM4E (0.55) KDM4EALDH1A1MEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8609318-B2 Radiation-sensitive resin composition, method for forming resist pattern and polymer JSR CORPORATION (JP) 2013-12-17 US disclosed
US-20120034560-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER JSR CORPORATION (JP) 2012-02-09 US disclosed