SCHEMBL564179

SCHEMBL564179

COc1ccc(O)c(-n2nc3ccc(C)cc3n2)c1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 8/20 0.61
NPC1 O15118 7/20 0.61
LMNA P02545 2/20 0.61
MEN1 O00255 5/20 0.40
KMT2A Q03164 5/20 0.40
MAPT P10636 5/20 0.40
MAPK1 P28482 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
ALDH1A1 P00352 4/20 0.40
SMN1; SMN2 Q16637 4/20 0.40
ERN1 O75460 1/20 0.40
TRIM24 O15164 1/20 0.40
TYR P14679 1/20 0.40
TRIM33 Q9UPN9 1/20 0.40
HTT P42858 1/20 0.40
KDM4E B2RXH2 5/20 0.39
POLB P06746 1/20 0.39
JAK2 O60674 1/20 0.39
NFKB1 P19838 1/20 0.39
CASP3 P42574 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29814623 1.00 RAB9A (0.61) RAB9ANPC1LMNAMEN1KMT2A
SCHEMBL6941182 0.94 RAB9A (0.66) RAB9ANPC1LMNAMEN1KMT2A
SCHEMBL28372141 0.87 RAB9A (0.59) RAB9ANPC1LMNAMEN1KMT2A
SCHEMBL3297579 0.86 NPC1 (0.81) RAB9ANPC1LMNAMEN1KMT2A
SCHEMBL14191504 0.85 RAB9A (0.48) RAB9ANPC1LMNAMEN1KMT2A
SCHEMBL29768260 0.85 RAB9A (0.64) RAB9ANPC1LMNAMEN1KMT2A
SCHEMBL563559 0.85 RAB9A (0.64) RAB9ANPC1LMNAMEN1KMT2A
SCHEMBL3274618 0.82 NPC1 (0.45) RAB9ANPC1LMNAMEN1KMT2A
SCHEMBL11160703 0.82 NPC1 (0.69) RAB9ANPC1LMNAMEN1KMT2A
SCHEMBL13412683 0.82 NPC1 (0.46) RAB9ANPC1LMNAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11655323-B2 Poly(amide-imide) copolymer film and method for preparing same LG CHEM, LTD. (KR) 2023-05-23 US disclosed
CN-110914345-B Poly (amide-imide) copolymer film and method of making the same 株式会社LG化学 2022-07-26 CN disclosed
US-20200369816-A1 POLY(AMIDE-IMIDE) COPOLYMER FILM AND METHOD FOR PREPARING SAME LG CHEM, LTD. (KR) 2020-11-26 US disclosed
EP-3640286-A1 AROMATIC POLY(AMIDE-IMIDE) COPOLYMER FILM AND PRODUCTION METHOD THEREFOR LG CHEM, LTD. (KR) 2020-04-22 EP disclosed
CN-110914345-A Poly (amide-imide) copolymer film and method of making the same 株式会社LG化学 2020-03-24 CN disclosed
CN-105489681-B Integrated halogen-free flame-retardant back package material for solar cell module 杭州福斯特光伏材料股份有限公司 2017-03-22 CN disclosed
US-9375903-B2 Laminated polyester film and hardcoat film TORAY INDUSTRIES, INC. (JP) 2016-06-28 US disclosed
US-20160177130-A1 HYBRID POLYSILOXANE COATED ARMOR OR FIBER SUBSTRATES SAVAGE RYAN HALE (US) 2016-06-23 US disclosed
US-8877334-B2 Surface protection film KIMOTO CO., LTD. (JP) 2014-11-04 US disclosed
EP-2666633-A1 LAYERED POLYESTER FILM AND HARDCOAT FILM Toray Industries, Inc. (JP) 2013-11-27 EP disclosed
EP-0303297-B1 Molded synthetic resin product MITSUBISHI KASEI VINYL (JP) 1994-06-22 EP disclosed
US-4957818-A COATING TO PREVENT MIGRATION OF PLASTICIZER FROM VINYL CHLORIDE RESIN MITSUBISHI KASEI VINYL COMPANY (JP) 1990-09-18 US disclosed
EP-0303297-A2 Molded synthetic resin product MITSUBISHI KASEI VINYL COMPANY (JP) 1989-02-15 EP disclosed
US-4670490-A CONTAINING DIESTER PLASTICIZER-MOLDING MATERIALS NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) 1987-06-02 US disclosed
EP-0065574-B1 PHOTOSYNTHETIC BACTERIA CULTURE NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) 1986-05-21 EP disclosed
EP-0134389-A2 Vinyl chloride resin composition NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) 1985-03-20 EP disclosed
US-4467035-A Cultivation of phototrophic bacteria in the absence of ultraviolet light NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) 1984-08-21 US disclosed
EP-0065574-A1 PHOTOSYNTHETIC BACTERIA CULTURE NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) 1982-12-01 EP disclosed
US-4235043-A Method for cultivating algae and a covering material used therefor Nippon Carbide Kogyo Kabashiki Kaisha (JP) 1980-11-25 US disclosed
US-3935164-A NICKEL 3,5-DI-TERT-ALKYL 4-HYDROXYBENZOATE, AND A BENZOPHENONE OR BENZOTRIAZOLE CIBA-GEIGY CORPORATION (US) 1976-01-27 US disclosed