SCHEMBL565301

SCHEMBL565301

Cc1ccc(S(=O)(=O)N2CCN(S(=O)(=O)c3ccc(C)cc3)CCN(S(=O)(=O)c3ccc(C)cc3)CCN(S(=O)(=O)c3ccc(C)cc3)CC2)cc1

nearest known ligand 0.88

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
PKM P14618 3/20 0.88
HTT P42858 2/20 0.88
ALDH1A1 P00352 2/20 0.88
POLB P06746 1/20 0.88
KMT2A Q03164 5/20 0.79
MEN1 O00255 3/20 0.79
GAA P10253 2/20 0.76
LMNA P02545 2/20 0.76
SMN1; SMN2 Q16637 1/20 0.76
TSHR P16473 1/20 0.72
CYP2C19 P33261 1/20 0.72
NPC1 O15118 1/20 0.67
RAB9A P51151 1/20 0.67

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3303527 1.00 PKM (0.88) PKMHTTALDH1A1POLBKMT2A
SCHEMBL699639 1.00 PKM (0.88) PKMHTTALDH1A1POLBKMT2A
SCHEMBL4537086 1.00 PKM (0.88) PKMHTTALDH1A1POLBKMT2A
SCHEMBL8200466 1.00 PKM (0.88) PKMHTTALDH1A1POLBKMT2A
SCHEMBL8203532 1.00 PKM (0.88) PKMHTTALDH1A1POLBKMT2A
SCHEMBL3971438 1.00 PKM (0.88) PKMHTTALDH1A1POLBKMT2A
SCHEMBL10724066 1.00 PKM (0.88) PKMHTTALDH1A1POLBKMT2A
SCHEMBL8502340 0.94 PKM (1.00) PKMHTTALDH1A1POLBKMT2A
SCHEMBL8583228 0.94 PKM (1.00) PKMHTTALDH1A1POLBKMT2A
SCHEMBL7953663 0.94 PKM (1.00) PKMHTTALDH1A1POLBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040104124-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2004-06-03 US claimed
US-6736954-B2 A METAL PLATING BATH COMPRISING METAL SALTS AND AN ADDITIVE CONSUMPTION INHIBITOR(A HETEROATOM ORGANIC COMPOUNDS WHICH MAY CONTAIN SULFUR, OXYGEN OR NITROGEN HETEROATOMS) IMPROVE THE BRIGHTNESS OF PLATED METAL AS WELL AS THE DUCTILITY SHIPLEY COMPANY, L.L.C. 2004-05-18 US claimed
EP-1308540-A1 Plating bath and method for depositing a metal layer on a substrate Shipley Co. L.L.C. (US) 2003-05-07 EP claimed
US-20030070934-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2003-04-17 US claimed
US-20150291538-A1 Macrocyclic Compositions And Metal Complexes For Bioimaging And Biomedical Applications UNIV NAT YANG MING (TW) 2015-10-15 US disclosed
US-20150291538-A1 Macrocyclic Compositions And Metal Complexes For Bioimaging And Biomedical Applications UNIV NAT YANG MING (TW) 2015-10-15 US disclosed
US-9062009-B2 Macrocyclic compounds and metal complexes for bioimaging and biomedical applications NATIONAL YANG MING UNIVERSITY (TW) 2015-06-23 US disclosed
US-9062009-B2 Macrocyclic compounds and metal complexes for bioimaging and biomedical applications NATIONAL YANG MING UNIVERSITY (TW) 2015-06-23 US disclosed
US-8956523-B2 Metal plating compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-02-17 US disclosed
US-20140187527-A1 Macrocyclic Compounds And Metal Complexes For Bioimaging And Biomedical Applications NATIONAL YANG MING UNIVERSITY (TW) 2014-07-03 US disclosed
US-20140187527-A1 Macrocyclic Compounds And Metal Complexes For Bioimaging And Biomedical Applications NATIONAL YANG MING UNIVERSITY (TW) 2014-07-03 US disclosed
US-20140081045-A1 METAL PLATING COMPOSITIONS AND METHODS ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-03-20 US disclosed
US-20080269395-A1 Metal plating compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-10-30 US disclosed
US-20080268138-A1 Metal plating compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-10-30 US disclosed
EP-1978051-A1 Metal plating compositions and methods Rohm and Haas Electronic Materials, L.L.C. (US) 2008-10-08 EP disclosed
EP-1978134-A1 Metal plating compositions Rohm and Haas Electronic Materials LLC (US) 2008-10-08 EP disclosed
US-20040104124-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2004-06-03 US disclosed
US-6736954-B2 A METAL PLATING BATH COMPRISING METAL SALTS AND AN ADDITIVE CONSUMPTION INHIBITOR(A HETEROATOM ORGANIC COMPOUNDS WHICH MAY CONTAIN SULFUR, OXYGEN OR NITROGEN HETEROATOMS) IMPROVE THE BRIGHTNESS OF PLATED METAL AS WELL AS THE DUCTILITY SHIPLEY COMPANY, L.L.C. 2004-05-18 US disclosed
EP-1308540-A1 Plating bath and method for depositing a metal layer on a substrate Shipley Co. L.L.C. (US) 2003-05-07 EP disclosed
US-20030070934-A1 Plating bath and method for depositing a metal layer on a substrate SHIPLEY COMPANY, L.L.C. 2003-04-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20140187527-A1 Macrocyclic Compounds And Metal Complexes For Bioimaging And Biomedical Applications DNASE1L3, DNASE1, SNRPA PKM 2036/4885HTT 2115/4885ALDH1A1 4108/4885
US-20150291538-A1 Macrocyclic Compositions And Metal Complexes For Bioimaging And Biomedical Applications DNASE1, DNASE1L3, SNRPA PKM 2256/4885HTT 2077/4885ALDH1A1 4325/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.