SCHEMBL5664358

SCHEMBL5664358

Cc1ccc2nc(-c3ccccc3N)sc2c1

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 9/20 0.69
SMN1; SMN2 Q16637 8/20 0.69
RAB9A P51151 6/20 0.69
KDM4E B2RXH2 6/20 0.69
NPC1 O15118 6/20 0.69
ALDH1A1 P00352 6/20 0.69
GAA P10253 4/20 0.69
MEN1 O00255 3/20 0.69
KMT2A Q03164 3/20 0.69
TDP1 Q9NUW8 1/20 0.69
L3MBTL1 Q9Y468 1/20 0.69
APP P05067 6/20 0.61
GLA P06280 2/20 0.61
SNCA P37840 1/20 0.51
HPGD P15428 3/20 0.49
PKM P14618 1/20 0.49
CCNE1 P24864 1/20 0.48
CDK2 P24941 1/20 0.48
CDK5 Q00535 1/20 0.48
CDK5R1 Q15078 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29657204 0.88 MAPT (0.69) MAPTSMN1; SMN2RAB9AKDM4ENPC1
SCHEMBL25327971 0.83 MAPT (0.71) MAPTSMN1; SMN2RAB9AKDM4ENPC1
SCHEMBL29656924 0.83 MAPT (0.67) MAPTSMN1; SMN2RAB9AKDM4ENPC1
SCHEMBL29478092 0.83 MAPT (0.71) MAPTSMN1; SMN2RAB9AKDM4ENPC1
SCHEMBL27648807 0.83 MAPT (0.67) MAPTSMN1; SMN2RAB9AKDM4ENPC1
SCHEMBL11224071 0.83 MAPT (0.52) MAPTSMN1; SMN2RAB9AKDM4ENPC1
SCHEMBL29437945 0.82 KDM4E (1.00) MAPTSMN1; SMN2RAB9AKDM4ENPC1
SCHEMBL914476 0.82 KDM4E (1.00) MAPTSMN1; SMN2RAB9AKDM4ENPC1
SCHEMBL30211740 0.81 MAPT (0.69) MAPTSMN1; SMN2RAB9AKDM4ENPC1
SCHEMBL25329016 0.81 MAPT (0.69) MAPTSMN1; SMN2RAB9AKDM4ENPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1301829-A4 RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES FUJIFILM ELECTRONIC MATERIALS (US) 2006-06-28 EP claimed
EP-1303789-A4 T-BUTYL CINNAMATE POLYMERS AND THEIR USE IN PHOTORESIST COMPOSITIONS ARCH SPEC CHEM INC (US) 2005-09-28 EP claimed
EP-1303789-A1 T-BUTYL CINNAMATE POLYMERS AND THEIR USE IN PHOTORESIST COMPOSITIONS ARCH SPECIALTY CHEMICALS, INC. (US) 2003-04-23 EP claimed
EP-1301829-A1 RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES ARCH SPECIALTY CHEMICALS, INC. (US) 2003-04-16 EP claimed
US-6514664-B1 Radiation sensitive compositions containing image quality and profile enhancement additives ARCH SPECIALTY CHEMICALS, INC. 2003-02-04 US claimed
WO-2002008834-A1 RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES ARCH SPECIALTY CHEMICALS, INC. (US) 2002-01-31 WO claimed
WO-2002006895-A1 T-BUTYL CINNAMATE POLYMERS AND THEIR USE IN PHOTORESIST COMPOSITIONS ARCH SPECIALTY CHEMICALS, INC (US) 2002-01-24 WO claimed
US-6312870-B1 t-butyl cinnamate polymers and their use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC. 2001-11-06 US claimed
EP-1301829-A4 RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES FUJIFILM ELECTRONIC MATERIALS (US) 2006-06-28 EP disclosed
EP-1303789-A4 T-BUTYL CINNAMATE POLYMERS AND THEIR USE IN PHOTORESIST COMPOSITIONS ARCH SPEC CHEM INC (US) 2005-09-28 EP disclosed
EP-1303789-A1 T-BUTYL CINNAMATE POLYMERS AND THEIR USE IN PHOTORESIST COMPOSITIONS ARCH SPECIALTY CHEMICALS, INC. (US) 2003-04-23 EP disclosed
EP-1301829-A1 RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES ARCH SPECIALTY CHEMICALS, INC. (US) 2003-04-16 EP disclosed
US-6514664-B1 Radiation sensitive compositions containing image quality and profile enhancement additives ARCH SPECIALTY CHEMICALS, INC. 2003-02-04 US disclosed
US-20030022097-A1 Tertiary-butyl acrylate polymers and their use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC (US) 2003-01-30 US disclosed
WO-2002008834-A1 RADIATION SENSITIVE COMPOSITIONS CONTAINING IMAGE QUALITY AND PROFILE ENHANCEMENT ADDITIVES ARCH SPECIALTY CHEMICALS, INC. (US) 2002-01-31 WO disclosed
WO-2002006895-A1 T-BUTYL CINNAMATE POLYMERS AND THEIR USE IN PHOTORESIST COMPOSITIONS ARCH SPECIALTY CHEMICALS, INC (US) 2002-01-24 WO disclosed
EP-1152295-A1 Tertiary-butyl acrylate polymers and their use in photoresist compositions Arch Specialty Chemicals, Inc. (US) 2001-11-07 EP disclosed
US-6312870-B1 t-butyl cinnamate polymers and their use in photoresist compositions ARCH SPECIALTY CHEMICALS, INC. 2001-11-06 US disclosed