⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28213322 | 0.82 | ALDH1A1 (0.36) | — | |
| SCHEMBL25187784 | 0.78 | — | — | |
| SCHEMBL28170781 | 0.77 | SMN1; SMN2 (0.37) | — | |
| SCHEMBL28095254 | 0.77 | TSHR (0.32) | — | |
| SCHEMBL6130781 | 0.75 | ACE2 (0.31) | — | |
| SCHEMBL557329 | 0.73 | — | — | |
| SCHEMBL5764932 | 0.73 | TSHR (0.30) | — | |
| SCHEMBL10011315 | 0.72 | TP53 (0.38) | — | |
| SCHEMBL439734 | 0.72 | LMNA (0.30) | — | |
| SCHEMBL26118830 | 0.72 | TSHR (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103627316-B | ARC of filling perforation and photoetching and preparation method thereof | 霍尼韦尔国际公司 | 2016-08-03 | — | — | CN | claimed |
| EP-1478681-A4 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INT INC (US) | 2006-10-11 | — | — | EP | disclosed |
| EP-1478681-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | Honeywell International, Inc. (US) | 2004-11-24 | — | — | EP | disclosed |
| WO-2003044077-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |