SCHEMBL5669441

SCHEMBL5669441

O=C(O)c1ccc(Oc2cc(C#Cc3ccccc3)cc(Oc3ccc(C(=O)O)cc3)c2)cc1

nearest known ligand 0.57

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 3/20 0.57
PARP10 Q53GL7 2/20 0.50
PARP15 Q460N3 1/20 0.50
PKM P14618 1/20 0.49
AKR1C3 P42330 1/20 0.49
HAO1 Q9UJM8 4/20 0.46
FFAR1 O14842 1/20 0.46
NR4A1 P22736 1/20 0.46
NR4A2 P43354 1/20 0.46
NR4A3 Q92570 1/20 0.46
POLB P06746 1/20 0.45
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45
NR1H4 Q96RI1 1/20 0.44
TTR P02766 1/20 0.44
RXRA P19793 1/20 0.43
RXRB P28702 1/20 0.43
RXRG P48443 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2707881 0.85 AKR1C3 (0.54) SRD5A2PARP10PARP15AKR1C3HAO1
Hydrochloric Acid SCHEMBL6342323 0.84 AKR1C3 (0.53) SRD5A2AKR1C3HAO1FFAR1MEN1
SCHEMBL13283916 0.83 LTA4H (0.61) FFAR1MEN1KMT2A
SCHEMBL5533189 0.83 FFAR1 (0.49) SRD5A2PARP10PARP15HAO1FFAR1
SCHEMBL29531785 0.82 PARP10 (0.69) SRD5A2PARP10PARP15AKR1C3POLB
SCHEMBL6368706 0.81 SRD5A2 (0.58) SRD5A2PARP10PARP15AKR1C3HAO1
SCHEMBL16103102 0.81 RARB (0.56) SRD5A2FFAR1
SCHEMBL13085869 0.80 APP (0.55) HAO1FFAR1MEN1KMT2A
SCHEMBL5406443 0.80 APP (0.55) HAO1FFAR1MEN1KMT2A
SCHEMBL13059383 0.80 SRD5A2 (0.57) SRD5A2PARP10PARP15AKR1C3HAO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1333050-B1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO (JP) 2006-12-27 EP disclosed
US-7049371-B2 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2006-05-23 US disclosed
US-20040002572-A1 Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2004-01-01 US disclosed
EP-1333050-A1 MATERIAL FOR INSULATING FILM, COATING VARNISH FOR INSULATING FILM, AND INSULATING FILM AND SEMICONDUCTOR DEVICE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2003-08-06 EP disclosed
EP-1327653-A1 HEAT-RESISTANT RESIN PRECURSOR, HEAT-RESISTANT RESIN AND INSULATING FILM AND SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2003-07-16 EP disclosed
US-6518390-B2 Polybenzoxazole and crosslinking agent SUMITOMO BAKELITE COMPANY, LTD. (JP) 2003-02-11 US disclosed
US-20020013443-A1 Precursor of a heat resistant resin, heat resistant resin, insulating film and semiconductor device SUMITOMO BAKELITE CO., LTD. (JP) 2002-01-31 US disclosed