SCHEMBL804991

SCHEMBL804991

C[Si]1(C)CCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4962305 1.00
SCHEMBL2973363 1.00
SCHEMBL7598956 1.00
Water SCHEMBL27495048 0.96
SCHEMBL567060 0.95
SCHEMBL9227127 0.82
SCHEMBL820464 0.80
SCHEMBL27473320 0.75
SCHEMBL27520070 0.72
SCHEMBL23146430 0.67 THRB (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 225 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110607103-B Anti-doodling transparent flame-retardant coating and preparation method thereof 苏州群鹰防腐材料有限公司 2021-04-02 CN claimed
CN-110607103-A Anti-doodling transparent flame-retardant coating and preparation method thereof 苏州群鹰防腐材料有限公司 2019-12-24 CN claimed
US-20130260575-A1 SILICON PRECURSORS AND COMPOSITIONS COMPRISING SAME FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-10-03 US claimed
CN-102770580-A Ultra-low dielectric materials formed by plasma enhanced chemical vapor deposition using hybrid precursors containing silicon with organofunctional groups APPLIED MATERIALS INC 2012-11-07 CN claimed
WO-2011106218-A2 ULTRA LOW DIELECTRIC MATERIALS USING HYBRID PRECURSORS CONTAINING SILICON WITH ORGANIC FUNCTIONAL GROUPS BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION APPLIED MATERIALS, INC. (US) 2011-09-01 WO claimed
US-20110206857-A1 ULTRA LOW DIELECTRIC MATERIALS USING HYBRID PRECURSORS CONTAINING SILICON WITH ORGANIC FUNCTIONAL GROUPS BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION APPLIED MATERIALS, INC. (US) 2011-08-25 US claimed
JP-2007532865-A 2007-11-15 JP claimed
EP-1716400-A1 CORROSION PROTECTION FOR PRESSURE SENSORS ROBERT BOSCH GMBH (DE) 2006-11-02 EP claimed
WO-2005075953-A1 CORROSION PROTECTION FOR PRESSURE SENSORS ROBERT BOSCH GMBH (DE) 2005-08-18 WO claimed
JP-11263793-A None JP disclosed
EP-4570877-A1 SURFACE TREATMENT AGENT DAIKIN INDUSTRIES, LTD. (JP) 2025-06-18 EP disclosed
EP-4509551-A1 SURFACE TREATMENT AGENT DAIKIN INDUSTRIES, LTD. (JP) 2025-02-19 EP disclosed
WO-2025028568-A1 SURFACE TREATMENT AGENT ダイキン工業株式会社 2025-02-06 WO disclosed
WO-2024034668-A1 SURFACE TREATMENT AGENT ダイキン工業株式会社 2024-02-15 WO disclosed
US-6607632-B1 One-part adhesive composition for bonding glass including:a cyanoacrylate monomer; one plasticizer by weight of the composition; at least one silane by weight of the composition. The silane may be is selected from the silanes LOCTITE (R&D) LIMITED (IE) 2003-08-19 US disclosed
EP-0918832-B1 CYANOACRYLATE ADHESIVE COMPOSITIONS FOR BONDING GLASS LOCTITE R & D LTD (IE) 2003-01-02 EP disclosed
EP-1108733-A1 Propylene-ethylene block copolymer, resin composition, and blow-molded article IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2001-06-20 EP disclosed
JP-H11263793-A CYCLIC SILICON COMPOUND HAVING FUNCTIONAL GROUP AGENCY OF IND SCIENCE & TECHNOL 1999-09-28 JP disclosed
CN-1027271-C Preparation method of n-statinib and n-cyclostatini polypeptide PFICER CO LTD (US) 1995-01-04 CN disclosed
CN-87101499-A Preparation method of n-statinib and n-cyclostatini polypeptide 1988-05-11 CN disclosed