Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.51 |
| ▸ | MEN1 | O00255 | 3/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | MAOB | P27338 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 2/20 | 0.43 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | ACHE | P22303 | 1/20 | 0.40 |
| ▸ | MGLL | Q99685 | 1/20 | 0.40 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14616993 | 0.99 | ALDH1A1 (0.49) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL7746053 | 0.91 | ALDH1A1 (0.50) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL3705822 | 0.88 | ALDH1A1 (0.47) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL26386361 | 0.86 | KMT2A (0.42) | ALDH1A1KMT2AMEN1KDM4EGAA | |
| SCHEMBL16226094 | 0.82 | ALDH1A1 (0.53) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL793387 | 0.79 | EPHX1 (0.62) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL13020964 | 0.79 | EPHX1 (0.62) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL12892548 | 0.79 | EPHX1 (0.62) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL1357850 | 0.78 | SMN1; SMN2 (0.45) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL20590967 | 0.78 | MAOB (0.53) | ALDH1A1KMT2AMEN1L3MBTL1MAOB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9494866-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-9411224-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-09 | — | — | US | disclosed |
| US-9411224-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-09 | — | — | US | disclosed |
| US-9405200-B2 | Resist composition and method of forming resist pattern | TOYKO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9405200-B2 | Resist composition and method of forming resist pattern | TOYKO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9377685-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| US-9377685-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-06-28 | — | — | US | disclosed |
| US-20150147702-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20150147702-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2015-05-28 | — | — | US | disclosed |
| US-9029070-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD (JP) | 2015-05-12 | — | — | US | disclosed |
| US-20130078572-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130017500-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20130017500-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20120205818-A1 | SELF-ALIGNED PERMANENT ON-CHIP INTERCONNECT STRUCTURE FORMED BY PITCH SPLITTING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-08-16 | — | — | US | disclosed |
| US-20120202158-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20120202158-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-8232198-B2 | Self-aligned permanent on-chip interconnect structure formed by pitch splitting | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-07-31 | — | — | US | disclosed |
| US-20120032336-A1 | SELF-ALIGNED PERMANENT ON-CHIP INTERCONNECT STRUCTURE FORMED BY PITCH SPLITTING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-02-09 | — | — | US | disclosed |
| US-20110091812-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20100304297-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |