Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 5/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.59 |
| ▸ | MEN1 | O00255 | 2/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.59 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.59 |
| ▸ | GAA | P10253 | 1/20 | 0.56 |
| ▸ | NPC1 | O15118 | 2/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12892548 | 1.00 | EPHX1 (0.62) | EPHX1ALDH1A1KMT2AMEN1KDM4E | |
| SCHEMBL13020964 | 1.00 | EPHX1 (0.62) | EPHX1ALDH1A1KMT2AMEN1KDM4E | |
| SCHEMBL11964040 | 0.88 | ALDH1A1 (0.60) | EPHX1ALDH1A1KMT2AMEN1KDM4E | |
| SCHEMBL910068 | 0.86 | EPHX1 (0.57) | EPHX1ALDH1A1KMT2AMEN1KDM4E | |
| SCHEMBL4916180 | 0.85 | EPHX1 (0.57) | EPHX1ALDH1A1KDM4ENPC1RAB9A | |
| SCHEMBL28842568 | 0.85 | EPHX1 (0.48) | EPHX1ALDH1A1KMT2AMEN1KDM4E | |
| SCHEMBL2200272 | 0.84 | EPHX1 (0.56) | EPHX1ALDH1A1KDM4ENPC1RAB9A | |
| SCHEMBL6331846 | 0.83 | EPHX1 (0.50) | EPHX1ALDH1A1KMT2AMEN1KDM4E | |
| SCHEMBL13056714 | 0.83 | ALDH1A1 (0.63) | EPHX1ALDH1A1KMT2AMEN1KDM4E | |
| SCHEMBL16226094 | 0.81 | ALDH1A1 (0.53) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 546 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250333773-A1 | SPATIAL CONTROL OF POLYNUCLEOTIDE SYNTHESIS BY STRAND CAPPING | MICROSOFT TECHNOLOGY LICENSING, LLC (US) | 2025-10-30 | — | — | US | claimed |
| US-20240168374-A1 | PHOTORESIST COMPOSITION | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-05-23 | — | — | US | claimed |
| US-11623975-B2 | Molding material and method for producing resin molded body using same | OSAKA UNIVERSITY (JP) | 2023-04-11 | — | — | US | claimed |
| US-20220162698-A1 | PHOTOACTIVE COMPOUNDS AND METHODS FOR BIOMOLECULE DETECTION AND SEQUENCING | VIBRANT HOLDINGS, LLC | 2022-05-26 | — | — | US | claimed |
| US-11168365-B2 | Photoactive compounds and methods for biomolecule detection and sequencing | VIBRANT HOLDINGS, LLC (US) | 2021-11-09 | — | — | US | claimed |
| WO-2018218250-A2 | PHOTOACTIVE COMPOUNDS AND METHODS FOR BIOMOLECULE DETECTION AND SEQUENCING | VIBRANT HOLDINGS, LLC (US) | 2018-11-29 | — | — | WO | claimed |
| CN-102053493-B | Radiation-sensitive composition, protective film and inter layer insulating film, and method for forming the same | JSR CORP | 2014-07-02 | — | — | CN | claimed |
| CN-101907828-B | Radiation-sensitive composition, protective film and inter layer insulating film, and process for forming the same | JSR CORP | 2013-10-16 | — | — | CN | claimed |
| US-8367190-B2 | At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same | LG CHEM, LTD. (KR) | 2013-02-05 | — | — | US | claimed |
| CN-102053493-A | Radiation-sensitive composition, protective film and inter layer insulating film, and method for forming the same | JSR CORP | 2011-05-11 | — | — | CN | claimed |
| US-6703190-B2 | Method for producing resist structures | INFINEON TECHNOLOGIES AG (DE) | 2004-03-09 | — | — | US | claimed |
| US-20030008240-A1 | Method for producing resist structures | POLARIS INNOVATIONS LIMITED (IE) | 2003-01-09 | — | — | US | claimed |
| US-20020187436-A1 | Method for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-12-12 | — | — | US | claimed |
| US-20020160317-A1 | Method for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-10-31 | — | — | US | claimed |
| US-20020160318-A1 | Method for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-10-31 | — | — | US | claimed |
| US-20020160316-A1 | Process for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-10-31 | — | — | US | claimed |
| US-20020160315-A1 | Process for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-10-31 | — | — | US | claimed |
| EP-1247141-A1 | CREATION OF RESIST STRUCTURES | Infineon Technologies AG (DE) | 2002-10-09 | — | — | EP | claimed |
| WO-2001042859-A1 | PRODUCTION OF RESIST STRUCTURES | INFINEON TECHNOLOGIES AG (DE) | 2001-06-14 | — | — | WO | claimed |
| WO-2001042860-A1 | CREATION OF RESIST STRUCTURES | INFINEON TECHNOLOGIES AG (DE) | 2001-06-14 | — | — | WO | claimed |