Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 9/20 | 0.73 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.73 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.73 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.66 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.66 |
| ▸ | TP53 | P04637 | 1/20 | 0.66 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.64 |
| ▸ | LMNA | P02545 | 3/20 | 0.64 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.63 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.56 |
| ▸ | POLB | P06746 | 1/20 | 0.56 |
| ▸ | SCN1A | P35498 | 1/20 | 0.50 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.50 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.49 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.49 |
| ▸ | ESR1 | P03372 | 1/20 | 0.47 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.47 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8459868 | 0.95 | TSHR (0.73) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL6596574 | 0.90 | ALDH1A1 (0.71) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL9278581 | 0.89 | TSHR (0.80) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL8477700 | 0.86 | TSHR (0.75) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL169573 | 0.86 | TSHR (0.75) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL8477699 | 0.86 | TSHR (0.75) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL10884807 | 0.86 | TSHR (0.75) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| SCHEMBL5597642 | 0.85 | TSHR (0.55) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| Dibutyl Phthalate SCHEMBL2330224 | 0.85 | TSHR (1.00) | TSHRTDP1L3MBTL1MAPK1CYP3A4 | |
| Dibutyl Phthalate SCHEMBL24051 | 0.85 | TSHR (1.00) | TSHRTDP1L3MBTL1MAPK1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0908473-B1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHINETSU CHEMICAL CO (JP) | 2006-02-01 | — | — | EP | claimed |
| EP-0908473-B1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHINETSU CHEMICAL CO (JP) | 2006-02-01 | — | — | EP | disclosed |
| US-6613844-B2 | Polyhydroxystyrene type polymer containing acid labile groups, endcapped and optionally crosslinked; improved alkali dissolution contrast, sensitivity, resolution, plasma etching resistance, heat resistance, and reproducibility | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-09-02 | — | — | US | disclosed |
| US-20030013832-A1 | Novel styrene polymer, chemically amplified positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-16 | — | — | US | disclosed |
| US-6384169-B1 | POLYHYDROXYSTYRENE WITH ACID LABILE GROUP, MODIFIED AT ENDS WITH ALKYLS, ESTERS OR ALCOHOLS; INCREASED DISSOLUTION RATE, HIGH SENSITIVITY AND RESOLUTION; RESIST PATTERNS HAVE PLASMA ETCHING RESISTANCE, HEAT RESISTANCE, REPRODUCIBILITY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-07 | — | — | US | disclosed |
| EP-0908473-A1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |