SCHEMBL5679443

SCHEMBL5679443

CCCCOCCOc1ccc(C=CC=Cc2ccc(O)cc2)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABCG2 Q9UNQ0 2/20 0.59
LTA4H P09960 3/20 0.57
NR5A1 Q13285 1/20 0.57
CHRNB2 P17787 1/20 0.52
CHRNB4 P30926 1/20 0.52
CHRNA3 P32297 1/20 0.52
CHRNA7 P36544 1/20 0.52
CHRNA4 P43681 1/20 0.52
RARB P10826 1/20 0.49
AHR P35869 1/20 0.49
PTGS1 P23219 1/20 0.47
PTGS2 P35354 1/20 0.47
APP P05067 2/20 0.46
MEN1 O00255 1/20 0.46
USP2 O75604 1/20 0.46
ALDH1A1 P00352 1/20 0.46
LMNA P02545 1/20 0.46
CYP3A4 P08684 1/20 0.46
MAPK1 P28482 1/20 0.46
CASP1 P29466 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9412326 0.90 ABCG2 (0.58) ABCG2LTA4HNR5A1CHRNB2CHRNB4
SCHEMBL7702904 0.88 APP (0.55) ABCG2LTA4HNR5A1CHRNB2CHRNB4
SCHEMBL9016366 0.87 LTA4H (0.72) ABCG2LTA4HNR5A1RARBAPP
SCHEMBL10576935 0.84 AHR (0.64) ABCG2LTA4HNR5A1CHRNA7AHR
SCHEMBL2622565 0.84 AHR (0.64) ABCG2LTA4HNR5A1CHRNA7AHR
SCHEMBL14566123 0.83 NR5A1 (0.83) LTA4HNR5A1RARBAPPMEN1
SCHEMBL10357881 0.83 NR5A1 (0.83) LTA4HNR5A1RARBAPPMEN1
SCHEMBL840785 0.83 NR5A1 (0.83) LTA4HNR5A1RARBAPPMEN1
SCHEMBL840786 0.83 NR5A1 (0.83) LTA4HNR5A1RARBAPPMEN1
SCHEMBL6937465 0.83 RARB (0.68) ABCG2LTA4HNR5A1RARBAPP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0908473-B1 Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process SHINETSU CHEMICAL CO (JP) 2006-02-01 EP disclosed
EP-0908473-A1 Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-04-14 EP disclosed