Sulfuric Acid

Sulfuric Acid

SCHEMBL5679463

CCOc1cc(Sc2ccc(OC)cc2)c(OCC)cc1[N+]#N.CCOc1cc(Sc2ccc(OC)cc2)c(OCC)cc1[N+]#N.O=S(=O)([O-])[O-]

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.39
MAPT P10636 3/20 0.39
KEAP1 Q14145 1/20 0.38
NFE2L2 Q16236 1/20 0.38
KMT2A Q03164 3/20 0.38
TSHR P16473 2/20 0.38
LMNA P02545 2/20 0.38
HTT P42858 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
S1PR1 P21453 1/20 0.36
MEN1 O00255 2/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
GAA P10253 3/20 0.35
KDM4E B2RXH2 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
PTGS2 P35354 2/20 0.34
PTGS1 P23219 1/20 0.34
MMP2 P08253 3/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL5679465 0.93 ALDH1A1 (0.39) ALDH1A1MAPTKEAP1NFE2L2KMT2A
Hydrochloric Acid SCHEMBL3801844 0.92 MEN1 (0.36) ALDH1A1MAPTKMT2AHTTMEN1
Sulfuric Acid SCHEMBL11340876 0.85 ALDH1A1 (0.36) ALDH1A1MAPTKMT2ALMNANPSR1
Trifluoromethanesulfonic Acid SCHEMBL8379815 0.83 KCNH2 (0.36) ALDH1A1MAPTKMT2ATSHRLMNA
Trifluoromethanesulfonic Acid SCHEMBL11071110 0.82 PTGS1 (0.34) ALDH1A1MAPTTSHRLMNANPSR1
SCHEMBL5665263 0.81 MAPT (0.43) ALDH1A1MAPTLMNAHTTNPSR1
Zinc Ion SCHEMBL11063710 0.80 MAPT (0.42) ALDH1A1MAPTLMNAHTTNPSR1
SCHEMBL11063706 0.80 MAPT (0.42) ALDH1A1MAPTLMNAHTTNPSR1
Hydrochloric Acid SCHEMBL9464793 0.80 MAPT (0.42) ALDH1A1MAPTLMNAHTTNPSR1
SCHEMBL11068289 0.80 POLB (0.35) ALDH1A1MAPTTSHRLMNANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1656551-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR Honeywell International Inc. (US) 2006-05-17 EP claimed
WO-2005019816-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR HONEYWELL INTERNATIONAL, INC. (US) 2005-03-03 WO claimed
US-20050042758-A1 Leak detection method using microencapsulated dye precursor HONEYWELL CORPORATION 2005-02-24 US claimed
EP-1421447-A4 IMAGEABLE COMPOSITION CONTAINING INFRARED ABSORBER WITH COUNTER ANION DERIVED FROM A NON-VOLATILE ACID KODAK POLYCHROME GRAPHICS LLC (US) 2006-09-06 EP disclosed
US-7056639-B2 Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid EASTMAN KODAK COMPANY (US) 2006-06-06 US disclosed
EP-1656551-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR Honeywell International Inc. (US) 2006-05-17 EP disclosed
US-6921620-B2 Acid curable composition of an acid generator; an infrared absorber; and optional colorant KODAK POLYCHROME GRAPHICS LLC (US) 2005-07-26 US disclosed
US-20050079439-A1 Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid KODAK POLYCHROME GRAPHICS LLC (US) 2005-04-14 US disclosed
WO-2005019816-A1 LEAK DETECTION METHOD USING MICROENCAPSULATED DYE PRECURSOR HONEYWELL INTERNATIONAL, INC. (US) 2005-03-03 WO disclosed
US-20050042758-A1 Leak detection method using microencapsulated dye precursor HONEYWELL CORPORATION 2005-02-24 US disclosed
US-6821583-B2 SUBSTRATE WITH A CROSSLINKED LAYER DISPOSED ON IT HAVING AN IMAGEABLE INK-RECEPTIVE LAYER THAT IS ABLATION FREE KODAK POLYCHROME GRAPHICS LLC 2004-11-23 US disclosed
US-6783911-B2 POSITIVE WORKING; HYDROXYFUNCTIONAL RESIN COMPRISING A COVALENTLY BOUND RADIATION SENSITIVE GROUP CAPABLE OF INCREASING THE SOLUBILITY OF SAID IMAGEABLE COMPOSITION IN AN ALKALINE DEVELOPER UPON EXPOSURE TO RADIATION KODAK POLYCHROME GRAPHICS LLC 2004-08-31 US disclosed
EP-1421447-A1 IMAGEABLE COMPOSITION CONTAINING INFRARED ABSORBER WITH COUNTER ANION DERIVED FROM A NON-VOLATILE ACID Kodak Polychrome Graphics LLC (US) 2004-05-26 EP disclosed
US-20040009363-A1 Substrate with a crosslinked layer disposed on it having an imageable ink-receptive layer that is ablation free KODAK POLYCHROME GRAPHICS, L.L.C. (US) 2004-01-15 US disclosed
US-20030194635-A1 Isocyanate crosslinked imageable compositions KODAK POLYCHROME GRAPHICS, L.L.C. 2003-10-16 US disclosed
US-20030129526-A1 Containing acid curable polymer, acid generator and infrared radiation absorberr KODAK POLYCHROME GRAPHICS, L.L.C. 2003-07-10 US disclosed
US-20030113655-A1 Acid curable composition of an acid generator; an infrared absorber; and optional colorant KODAK POLYCHROME GRAPHICS, L.L.C 2003-06-19 US disclosed
WO-2003019294-A1 IMAGEABLE COMPOSITION CONTAINING INFRARED ABSORBER WITH COUNTER ANION DERIVED FROM A NON-VOLATILE ACID KODAK POLYCHROME GRAPHICS, L.L.C. (US) 2003-03-06 WO disclosed