Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FABP4 | P15090 | 6/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | FABP3 | P05413 | 2/20 | 0.47 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.47 |
| ▸ | PIK3CD | O00329 | 2/20 | 0.44 |
| ▸ | PIK3CA | P42336 | 2/20 | 0.44 |
| ▸ | PIK3CB | P42338 | 2/20 | 0.44 |
| ▸ | PIK3CG | P48736 | 2/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | PSEN1 | P49768 | 2/20 | 0.37 |
| ▸ | PSEN2 | P49810 | 2/20 | 0.37 |
| ▸ | APH1B | Q8WW43 | 2/20 | 0.37 |
| ▸ | NCSTN | Q92542 | 2/20 | 0.37 |
| ▸ | APH1A | Q96BI3 | 2/20 | 0.37 |
| ▸ | PSENEN | Q9NZ42 | 2/20 | 0.37 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.33 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.32 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5694151 | 0.76 | FABP4 (0.54) | FABP4ALDH1A1FABP3FABP5PIK3CD | |
| SCHEMBL9498378 | 0.73 | FABP4 (0.57) | FABP4ALDH1A1FABP3FABP5PIK3CD | |
| SCHEMBL9108321 | 0.73 | FABP4 (1.00) | FABP4ALDH1A1FABP3FABP5GAA | |
| SCHEMBL840945 | 0.73 | FABP4 (1.00) | FABP4ALDH1A1FABP3FABP5GAA | |
| SCHEMBL1123484 | 0.70 | FABP4 (0.47) | FABP4ALDH1A1FABP3FABP5PIK3CD | |
| SCHEMBL8989764 | 0.68 | FABP4 (0.69) | FABP4ALDH1A1FABP3FABP5PIK3CD | |
| Lithium Ion SCHEMBL22772590 | 0.68 | FABP4 (0.62) | FABP4ALDH1A1FABP3FABP5PIK3CD | |
| SCHEMBL28654071 | 0.68 | FABP4 (0.62) | FABP4ALDH1A1FABP3FABP5PIK3CD | |
| Potassium Ion SCHEMBL28654165 | 0.68 | FABP4 (0.62) | FABP4ALDH1A1FABP3FABP5PIK3CD | |
| SCHEMBL2322598 | 0.68 | FABP4 (0.62) | FABP4ALDH1A1FABP3FABP5PIK3CD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104087145-B | A kind of fire-retardant preparation method with germ resistance aqueous polyurethane coating | DUAN BAORONG (CN) | 2016-03-02 | — | — | CN | claimed |
| CN-104087145-A | Preparation method of flame-retardant and antibacterial water-based polyurethane coating | DUAN BAORONG | 2014-10-08 | — | — | CN | claimed |
| US-20060222997-A1 | Adhesion improver for photosensitive resin composition and photosensitive resin composition containing same | KOBAYASHI SATOSHI | 2006-10-05 | — | — | US | claimed |
| US-11935803-B2 | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer and semiconductor device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-03-19 | — | — | US | disclosed |
| CN-112004845-B | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate, and semiconductor device | 三菱瓦斯化学株式会社 | 2022-05-31 | — | — | CN | disclosed |
| US-20210277221-A1 | RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR WAFER WITH RESIN COMPOSITION LAYER, SUBSTRATE FOR MOUNTING SEMICONDUCTOR WITH RESIN COMPOSITION LAYER AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-09-09 | — | — | US | disclosed |
| CN-106019830-B | Resist composition and method for producing resist pattern | 住友化学株式会社 | 2021-08-20 | — | — | CN | disclosed |
| EP-3786200-A1 | RESIN COMPOSITION, LAMINATE, RESIN COMPOSITION LAYER-ATTACHED SEMICONDUCTOR WAFER, SUBSTRATE FOR MOUNTING RESIN COMPOSITION LAYER-ATTACHED SEMICONDUCTOR, AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-03 | — | — | EP | disclosed |
| CN-112004845-A | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer, and semiconductor device | 三菱瓦斯化学株式会社 | 2020-11-27 | — | — | CN | disclosed |
| US-9946157-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-17 | — | — | US | disclosed |
| US-20160291464-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| CN-104087145-A | Preparation method of flame-retardant and antibacterial water-based polyurethane coating | DUAN BAORONG | 2014-10-08 | — | — | CN | disclosed |
| US-20060222997-A1 | Adhesion improver for photosensitive resin composition and photosensitive resin composition containing same | KOBAYASHI SATOSHI | 2006-10-05 | — | — | US | disclosed |
| EP-1647860-A1 | ADHESION IMPROVER FOR PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME | AZ Electronic Materials (Japan) K.K. (JP) | 2006-04-19 | — | — | EP | disclosed |
| US-5482920-A | Triazinyl compounds with herbicidal activity | CIBA-GEIGY CORPORATION (US) | 1996-01-09 | — | — | US | disclosed |
| WO-1996000219-A1 | PYRIMIDINYL- AND TRIAZINYL-OXY AND THIO-3-HALOALKYL-PROPIONIC ACID DERIVATIVES AS HERBICIDES | CIBA-GEIGY AG (CH) | 1996-01-04 | — | — | WO | disclosed |
| EP-0601155-A1 | PYRIMIDINYL-AND TRIAZINYL COMPOUNDS WITH HERBICIDAL ACTIVITY | Novartis AG (CH) | 1994-06-15 | — | — | EP | disclosed |
| WO-1994010156-A1 | HERBICIDALLY ACTIVE PYRIMIDINYL AND TRIAZINYL COMPOUNDS | CIBA-GEIGY AG (CH) | 1994-05-11 | — | — | WO | disclosed |
| WO-1993025540-A1 | PYRIMIDINYL-AND TRIAZINYL COMPOUNDS WITH HERBICIDAL ACTIVITY | CIBA-GEIGY AG (CH) | 1993-12-23 | — | — | WO | disclosed |
| WO-1993024468-A1 | PYRIMIDINYL- AND TRIAZINYL- SALICYL- AND PICOLYLAMIDES AND THE USE, AS HERBICIDES, AND PREPARATION THEREOF | CIBA-GEIGY AG (CH) | 1993-12-09 | — | — | WO | disclosed |