SCHEMBL5696569

SCHEMBL5696569

[CH2]OC1CCCCC1C1CCCCC1

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6383053 0.79 ALDH1A1 (0.37) ALDH1A1
SCHEMBL5696574 0.77 KDM4E (0.38) ALDH1A1
SCHEMBL10520170 0.75
SCHEMBL8585837 0.74 ALDH1A1 (0.37) ALDH1A1
SCHEMBL27664167 0.74 ALDH1A1 (0.37) ALDH1A1
SCHEMBL723345 0.73 ALDH1A1 (0.32) ALDH1A1
SCHEMBL7735453 0.72 KDM4E (0.38) ALDH1A1
SCHEMBL96944 0.72 KDM4E (0.38) ALDH1A1
SCHEMBL10825504 0.72 KDM4E (0.38) ALDH1A1
SCHEMBL3003299 0.71 ALDH1A1 (0.54) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7091294-B2 Fluoropolymer and resist composition ASAHI GLASS COMPANY, LIMITED (JP) 2006-08-15 US claimed
US-20050234206-A1 Fluoropolymer and resist composition ASAHI GLASS COMPANY, LIMITED (JP) 2005-10-20 US claimed
US-7091294-B2 Fluoropolymer and resist composition ASAHI GLASS COMPANY, LIMITED (JP) 2006-08-15 US disclosed
US-20060135663-A1 Fluorinated copolymer process for its production and resist composition containing it ASAHI GLASS COMPANY, LIMITED (JP) 2006-06-22 US disclosed
EP-1657264-A1 FLUOROCOPOLYMER, PROCESS FOR PRODUCING THE SAME, AND RESIST COMPOSITION CONTAINING THE SAME ASAHI GLASS COMPANY LTD. (JP) 2006-05-17 EP disclosed
US-20050234206-A1 Fluoropolymer and resist composition ASAHI GLASS COMPANY, LIMITED (JP) 2005-10-20 US disclosed
JP-2005017387-A RESIST COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 2005-01-20 JP disclosed