SCHEMBL5696574

SCHEMBL5696574

COC1CCCCC1C1CCCCC1

nearest known ligand 0.38

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.38
ALDH1A1 P00352 5/20 0.35
APLNR P35414 1/20 0.32
LMNA P02545 1/20 0.31
HTT P42858 1/20 0.31
POLB P06746 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL96944 0.95 KDM4E (0.38) KDM4EALDH1A1APLNRLMNAHTT
SCHEMBL10825504 0.95 KDM4E (0.38) KDM4EALDH1A1APLNRLMNAHTT
SCHEMBL7735453 0.95 KDM4E (0.38) KDM4EALDH1A1APLNRLMNAHTT
SCHEMBL22007037 0.92 KDM4E (0.34) KDM4EALDH1A1APLNR
SCHEMBL96365 0.92 KDM4E (0.34) KDM4EALDH1A1APLNR
SCHEMBL96759 0.90 APLNR (0.37) KDM4EALDH1A1APLNR
SCHEMBL96617 0.87 KDM4E (0.32) KDM4EAPLNR
SCHEMBL14223298 0.84 APLNR (0.37) APLNR
SCHEMBL25487367 0.83 KDM4E (0.43) KDM4EALDH1A1APLNRLMNAHTT
SCHEMBL6383053 0.81 ALDH1A1 (0.37) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7091294-B2 Fluoropolymer and resist composition ASAHI GLASS COMPANY, LIMITED (JP) 2006-08-15 US claimed
US-20050234206-A1 Fluoropolymer and resist composition ASAHI GLASS COMPANY, LIMITED (JP) 2005-10-20 US claimed
US-7091294-B2 Fluoropolymer and resist composition ASAHI GLASS COMPANY, LIMITED (JP) 2006-08-15 US disclosed
US-20060135663-A1 Fluorinated copolymer process for its production and resist composition containing it ASAHI GLASS COMPANY, LIMITED (JP) 2006-06-22 US disclosed
EP-1657264-A1 FLUOROCOPOLYMER, PROCESS FOR PRODUCING THE SAME, AND RESIST COMPOSITION CONTAINING THE SAME ASAHI GLASS COMPANY LTD. (JP) 2006-05-17 EP disclosed
US-20050234206-A1 Fluoropolymer and resist composition ASAHI GLASS COMPANY, LIMITED (JP) 2005-10-20 US disclosed
JP-2005017387-A RESIST COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 2005-01-20 JP disclosed