⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15534574 | 0.74 | — | — | |
| SCHEMBL7424819 | 0.73 | ALDH1A1 (0.44) | — | |
| SCHEMBL5697636 | 0.71 | ALDH1A1 (0.32) | — | |
| SCHEMBL2050721 | 0.70 | — | — | |
| SCHEMBL605387 | 0.70 | — | — | |
| SCHEMBL867614 | 0.67 | — | — | |
| SCHEMBL1149120 | 0.67 | — | — | |
| SCHEMBL247242 | 0.67 | — | — | |
| SCHEMBL5921891 | 0.64 | — | — | |
| SCHEMBL17729854 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114423742-B | Benzotriazole-based compound, light absorber and resin composition | 三井化学株式会社 | 2024-05-28 | — | — | CN | disclosed |
| CN-117466830-A | Benzotriazole-based compound, light absorber and resin composition | 三井化学株式会社 | 2024-01-30 | — | — | CN | disclosed |
| EP-1441256-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2006-05-31 | — | — | EP | disclosed |
| EP-0789278-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2005-05-04 | — | — | EP | disclosed |
| US-6794459-B2 | PHOTOLITHOGRAPHY | SUMITOMO BAKELITE CO., LTD. (JP) | 2004-09-21 | — | — | US | disclosed |
| EP-1441256-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2004-07-28 | — | — | EP | disclosed |
| US-6727032-B1 | USEFUL IN MICRO-PROCESSING USING VARIOUS RADIATIONS, E.G., FAR-ULTRAVIOLET RADIATION SUCH AS KRF EXCIMER LASER OR ARF EXCIMER LASER, X RAYS SUCH AS SYNCHROTRON RADIATION, CHARGED PARTICLE RADIATION SUCH AS ELECTRON BEAM, ETC. | JSR CORPORATION (JP) | 2004-04-27 | — | — | US | disclosed |
| EP-1060206-B1 | MODIFIED POLYCYCLIC POLYMERS | SUMITOMO BAKELITE CO (JP) | 2004-04-14 | — | — | EP | disclosed |
| US-6692887-B1 | COPOLYMER OF SUCH AS MALEIC ANHYDRIDE AND NORBORNENE ACID CLEAVABLE DERIVATIVE; TRANSPARENCY; DRY ETCHING RESISTANCE; PHOTORESIST PATTERN WITH HIGH ADHESION, SENSITIVITY, RESOLUTION AND DEVELOPABILITY | JSR CORPORATION (JP) | 2004-02-17 | — | — | US | disclosed |
| EP-1157058-B1 | METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS | SUMITOMO BAKELITE CO (JP) | 2003-06-25 | — | — | EP | disclosed |
| US-6309796-B1 | PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-30 | — | — | US | disclosed |
| US-6235849-B1 | INCLUDE COPOLYMERS WITH ONE OR MORE COMONOMERS SUCH AS NORBORNENE, ETHYLENE, AN ACRYLATE OR SULFUR DIOXIDE OR CARBON MONOXIDE; ALSO RING-OPENING METATHESIS POLYMERIZATION; GROUP VIII METAL COMPOUND CATALYST | THE B. F. GOODRICH COMPANY | 2001-05-22 | — | — | US | disclosed |
| EP-1060206-A1 | MODIFIED POLYCYCLIC POLYMERS | The B.F.Goodrich Co. (US) | 2000-12-20 | — | — | EP | disclosed |
| WO-2000046267-A1 | METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS | THE B.F. GOODRICH COMPANY (US) | 2000-08-10 | — | — | WO | disclosed |
| WO-2000046268-A1 | NORBORNENE SULFONAMIDE POLYMERS | THE B.F. GOODRICH COMPANY (US) | 2000-08-10 | — | — | WO | disclosed |
| WO-1999042510-A1 | MODIFIED POLYCYCLIC POLYMERS | THE B.F. GOODRICH COMPANY (US) | 1999-08-26 | — | — | WO | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| US-5594006-A | SUCH AS COLLEGENASE, STROMELYSIN; ANTICANCER AGENTS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1997-01-14 | — | — | US | disclosed |
| EP-0641323-A1 | CARBOSTYRIL DERIVATIVES AS MATRIX METALLOPROTEINASES INHIBITORS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1995-03-08 | — | — | EP | disclosed |
| WO-1994021612-A1 | CARBOSTYRIL DERIVATIVES AS MATRIX METALLOPROTEINASES INHIBITORS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 1994-09-29 | — | — | WO | disclosed |