⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5701351 | 0.75 | ALDH1A1 (0.35) | — | |
| SCHEMBL2095164 | 0.69 | — | — | |
| SCHEMBL6286055 | 0.69 | — | — | |
| SCHEMBL5523434 | 0.69 | — | — | |
| SCHEMBL12271682 | 0.67 | — | — | |
| SCHEMBL5701881 | 0.67 | TDP1 (0.31) | — | |
| SCHEMBL2246690 | 0.67 | — | — | |
| SCHEMBL5702109 | 0.67 | — | — | |
| SCHEMBL28646938 | 0.65 | TSHR (0.31) | — | |
| SCHEMBL6609553 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1693707-A1 | Positive resist composition, and patterning process using the same | Shinetsu Chemical Co., Ltd. (JP) | 2006-08-23 | — | — | EP | disclosed |
| US-20060183051-A1 | Positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-08-17 | — | — | US | disclosed |