SCHEMBL5701351

SCHEMBL5701351

CCC(C)(C)OC(Cl)C=O

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35
TSHR P16473 1/20 0.35
TDP1 Q9NUW8 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5701318 0.75
SCHEMBL14142873 0.74 ALDH1A1 (0.36) ALDH1A1TSHRTDP1
SCHEMBL7534831 0.67 ALDH1A1 (0.38) ALDH1A1TSHRTDP1
SCHEMBL4356610 0.67 ALDH1A1 (0.38) ALDH1A1TSHRTDP1
SCHEMBL9036085 0.65
SCHEMBL28331211 0.65
SCHEMBL4393765 0.65
SCHEMBL4363114 0.65 ALDH1A1 (0.36) ALDH1A1TSHRTDP1
SCHEMBL8566200 0.65 ALDH1A1 (0.36) ALDH1A1TSHRTDP1
SCHEMBL22641704 0.64 TSHR (0.45) ALDH1A1TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1693707-A1 Positive resist composition, and patterning process using the same Shinetsu Chemical Co., Ltd. (JP) 2006-08-23 EP disclosed
US-20060183051-A1 Positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-08-17 US disclosed