SCHEMBL5701549

SCHEMBL5701549

C1=Cc2cccc1c2.CCO[SiH](OCC)OCC

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.31
CYP3A4 P08684 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21248101 0.80
SCHEMBL2061952 0.75 ACHE (0.30)
Anthracene SCHEMBL4585948 0.73 CYP2A6 (0.41) CYP3A4
SCHEMBL5701485 0.73 RET (0.32)
Benzene SCHEMBL27590784 0.72
Naphthalene SCHEMBL28826709 0.72 CYP2A6 (0.42) TP53
Benz(B)Anthracene SCHEMBL4585299 0.71 CYP2A6 (0.40) CYP3A4
SCHEMBL4585435 0.71 CYP2A6 (0.40) CYP3A4
SCHEMBL4585997 0.71 CYP2A6 (0.40) CYP3A4
SCHEMBL21247627 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024024502-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2024-02-01 WO disclosed
WO-2024024501-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2024-02-01 WO disclosed
CN-117148676-A Negative photoresist composition for organic insulating film of liquid crystal display element 烟台希尔德材料科技有限公司 2023-12-01 CN disclosed
CN-116848466-A Positive photosensitive resin composition 日产化学株式会社 2023-10-03 CN disclosed
US-20140014928-A1 ORGANIC EL ELEMENT, RADIATION-SENSITIVE RESIN COMPOSITION, AND CURED FILM JSR CORPORATION (JP) 2014-01-16 US disclosed
EP-1510520-B1 Preparation of branched siloxane SHINETSU CHEMICAL CO (JP) 2006-07-26 EP disclosed
US-6943264-B2 Preparation of branched siloxane SHIN-ETSU CHEMICAL, CO., LTD. (JP) 2005-09-13 US disclosed
US-20050049427-A1 Preparation of branched siloxane SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-03-03 US disclosed
EP-1510520-A1 Preparation of branched siloxane Shin-Etsu Chemical Co., Ltd. (JP) 2005-03-02 EP disclosed