SCHEMBL570773

SCHEMBL570773

C=Cc1ccc([Mg]Br)cc1

nearest known ligand 0.58

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.58
TSHR P16473 1/20 0.43
TDP1 Q9NUW8 2/20 0.38
HDAC8 Q9BY41 1/20 0.37
TP53 P04637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL473081 0.76 ALDH1A1 (1.00) ALDH1A1TSHRTDP1HDAC8TP53
SCHEMBL7639 0.76 ALDH1A1 (1.00) ALDH1A1TSHRTDP1HDAC8TP53
SCHEMBL701586 0.74 ALDH1A1 (0.58) ALDH1A1TSHRTDP1HDAC8TP53
Bromide SCHEMBL4189982 0.74 ALDH1A1 (0.58) ALDH1A1TSHRTDP1HDAC8TP53
Hydrochloric Acid SCHEMBL23581954 0.73 ALDH1A1 (0.92) ALDH1A1TSHRTDP1HDAC8TP53
Water SCHEMBL20378930 0.73 ALDH1A1 (0.92) ALDH1A1TSHRTDP1HDAC8TP53
SCHEMBL29229894 0.73 ALDH1A1 (0.92) ALDH1A1TSHRTDP1HDAC8TP53
Ethylene SCHEMBL7955374 0.73 ALDH1A1 (0.92) ALDH1A1TSHRTDP1HDAC8TP53
SCHEMBL22496003 0.73 ALDH1A1 (0.92) ALDH1A1TSHRTDP1HDAC8TP53
SCHEMBL6935569 0.73 ALDH1A1 (0.92) ALDH1A1TSHRTDP1HDAC8TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119406454-A Phosphorus-containing porous organic polymer supported nickel catalyst and preparation method thereof 兰州大学 2025-02-11 CN claimed
CN-114014833-B Method for preparing cyclic carbonate from low-concentration carbon dioxide and catalyst used by method 浙江理工大学 2023-09-15 CN claimed
CN-114014833-A Method for preparing cyclic carbonate from low-concentration carbon dioxide and catalyst used in method 浙江理工大学 2022-02-08 CN claimed
US-20260056463-A1 HYPERVALENT BISMUTH COMPOUND, RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-26 US disclosed
CN-119406454-A Phosphorus-containing porous organic polymer supported nickel catalyst and preparation method thereof 兰州大学 2025-02-11 CN disclosed
CN-117683405-A Quantum dot ink, quantum dot light-emitting device, preparation method and display device 广东聚华印刷显示技术有限公司 2024-03-12 CN disclosed
CN-114014833-B Method for preparing cyclic carbonate from low-concentration carbon dioxide and catalyst used by method 浙江理工大学 2023-09-15 CN disclosed
WO-2022039212-A1 POLYMER, RESIST COMPOSITION CONTAINING SAID POLYMER, METHOD FOR MANUFACTURING MEMBER USING SAME, PATTERN FORMATION METHOD, AND METHOD FOR FORMING REVERSAL PATTERN 東洋合成工業株式会社 2022-02-24 WO disclosed
CN-114014833-A Method for preparing cyclic carbonate from low-concentration carbon dioxide and catalyst used in method 浙江理工大学 2022-02-08 CN disclosed
WO-2020196140-A1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIALS 三菱瓦斯化学株式会社 2020-10-01 WO disclosed
US-10781276-B2 Polymer, resist composition containing polymer, and method for manufacturing device using same TOYO GOSEI CO., LTD. (JP) 2020-09-22 US disclosed
EP-1546217-A1 PENTAARYLCYCLOPENTADIENYL UNITS AS ACTIVE UNITS IN RESISTIVE MEMORY ELEMENTS Infineon Technologies AG (DE) 2005-06-29 EP disclosed
US-20050131014-A1 Quinolines useful in treating cardiovascular disease WYETH (US) 2005-06-16 US disclosed
US-6794109-B2 POLYMER CONTAINING A FLUORINATED STYRENE COPOLYMER MASSACHUSETTS INSTITUTE OF TECHNOLOGY 2004-09-21 US disclosed
WO-2004031247-A1 PENTAARYLCYCLOPENTADIENYL UNITS AS ACTIVE UNITS IN RESISTIVE MEMORY ELEMENTS INFINEON TECHNOLOGIES AG (DE) 2004-04-15 WO disclosed
US-20040009424-A1 Protecting groups for lithographic resist compositions MASS INSTITUTE OF TECHNOLOGY (MIT) 2004-01-15 US disclosed
WO-2003075092-A2 PROTECTING GROUP-CONTAINING POLYMERS FOR LITHOGRAPHIC RESIST COMPOSITIONS MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2003-09-12 WO disclosed
US-20020160297-A1 Low abosorbing resists for 157 nm lithography AIR FORCE, UNITED STATES 2002-10-31 US disclosed
WO-2002069043-A2 LOW ABSORBING RESISTS FOR 157 NM LITHOGRAPHY MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2002-09-06 WO disclosed
EP-0710663-A1 Boron-containing compound, its polymer, catalyst comprising the polymer and metallocene compound, and process for producing polyolefin Japan Polyolefins Co., Ltd. (JP) 1996-05-08 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260056463-A1 HYPERVALENT BISMUTH COMPOUND, RESIST COMPOSITION AND PATTERN FORMING PROCESS BMI1, ETV6, ETV1 ALDH1A1 2780/4885TSHR 2651/4885TDP1 3841/4885
US-20050131014-A1 Quinolines useful in treating cardiovascular disease NR1H2, NR1H3, SREBF1 ALDH1A1 1202/4885TSHR 2030/4885TDP1 2710/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.