SCHEMBL5709657

SCHEMBL5709657

CC(C)(C)c1ccc([I+]c2ccc(C(C)(C)C)cc2)cc1.Cc1ccc(S(=O)(=O)Oc2ccc(S(=O)(=O)[O-])cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.50
KMT2A Q03164 3/20 0.50
ALDH1A1 P00352 2/20 0.50
MAPT P10636 2/20 0.50
RECQL P46063 1/20 0.50
LMNA P02545 2/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
HTT P42858 2/20 0.47
ENPP1 P22413 8/20 0.46
ENPP3 O14638 7/20 0.46
ENPP2 Q13822 4/20 0.46
CA2 P00918 2/20 0.43
CA1 P00915 1/20 0.43
CA9 Q16790 1/20 0.43
HSD11B1 P28845 1/20 0.42
HSD17B3 P37058 1/20 0.42
KDM4E B2RXH2 1/20 0.42
KDM4A O75164 1/20 0.42
APEX1 P27695 1/20 0.40
CA12 O43570 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13202813 0.95 MEN1 (0.54) MEN1KMT2AALDH1A1MAPTRECQL
SCHEMBL6742784 0.89 MEN1 (0.50) MEN1KMT2AALDH1A1MAPTRECQL
SCHEMBL51290 0.88 TSHR (0.50) MEN1KMT2AALDH1A1MAPTLMNA
SCHEMBL5709684 0.87 HSD11B1 (0.43) MEN1KMT2AALDH1A1MAPTRECQL
SCHEMBL2990067 0.86 MEN1 (0.62) MEN1KMT2AALDH1A1MAPTRECQL
SCHEMBL5709663 0.86 MEN1 (0.54) MEN1KMT2AALDH1A1MAPTRECQL
Hydrogen Sulfide SCHEMBL15618664 0.85 MEN1 (0.61) MEN1KMT2AALDH1A1MAPTRECQL
Iodide SCHEMBL29092642 0.85 MEN1 (0.61) MEN1KMT2AALDH1A1MAPTRECQL
SCHEMBL5709615 0.84 TDP1 (0.46) MEN1KMT2AALDH1A1MAPTLMNA
SCHEMBL6741621 0.83 HSD11B1 (0.43) MEN1KMT2AALDH1A1MAPTRECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1077391-B1 Onium salts, photoacid generators for resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2006-09-27 EP disclosed
US-6838224-B2 Chemical amplification, positive resist compositions SHI-ETSU CHEMICAL CO., LTD. (JP) 2005-01-04 US disclosed
US-6682869-B2 IN POLYMER SHIN-ETU CHEMICAL CO., LTD. (JP) 2004-01-27 US disclosed
US-6440634-B1 MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS SHIN-ETSU CHEMICAL CO., LTD (JP) 2002-08-27 US disclosed
US-20010038971-A1 Chemical amplification, positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-11-08 US disclosed
US-20010033994-A1 Chemical amplification, positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-10-25 US disclosed
EP-1077391-A1 Onium salts, photoacid generators for resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-02-21 EP disclosed