SCHEMBL51290

SCHEMBL51290

CC(C)(C)c1ccc([I+]c2ccc(C(C)(C)C)cc2)cc1.Cc1ccc(S(=O)(=O)[O-])cc1

nearest known ligand 0.50

Known targets — ChEMBL curated mechanism

CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.50
ACHE P22303 2/20 0.48
BCHE P06276 1/20 0.48
LMNA P02545 4/20 0.47
HTT P42858 3/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
ALDH1A1 P00352 5/20 0.46
HSD11B1 P28845 2/20 0.44
HSD17B2 P37059 2/20 0.41
TLR9 Q9NR96 1/20 0.40
NPC1 O15118 1/20 0.40
MAPT P10636 1/20 0.40
RAB9A P51151 1/20 0.40
GAA P10253 2/20 0.39
HCRTR2 O43614 1/20 0.39
USP2 O75604 1/20 0.39
ALOX15 P16050 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
KDM4E B2RXH2 1/20 0.38
MEN1 O00255 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8131241 0.93 ALDH1A1 (0.52) TSHRACHELMNAHTTSMN1; SMN2
SCHEMBL3753877 0.93 LMNA (0.43) TSHRACHEBCHELMNAHTT
SCHEMBL3757627 0.93 LMNA (0.43) TSHRACHEBCHELMNAHTT
SCHEMBL5709657 0.88 MEN1 (0.50) LMNAHTTSMN1; SMN2ALDH1A1HSD11B1
Toliodium SCHEMBL2895871 0.88 GAA (0.50) ACHELMNASMN1; SMN2ALDH1A1TLR9
SCHEMBL452774 0.87 ALDH1A1 (0.46) ACHELMNAHTTSMN1; SMN2ALDH1A1
SCHEMBL217706 0.86 ALDH1A1 (0.48) TSHRACHELMNAHTTSMN1; SMN2
SCHEMBL2961938 0.85 HSD11B1 (0.46) TSHRACHELMNAHTTSMN1; SMN2
SCHEMBL503480 0.85 ALDH1A1 (0.44) ACHELMNAALDH1A1HSD11B1GAA
SCHEMBL8131239 0.85 ALDH1A1 (0.44) ACHELMNASMN1; SMN2ALDH1A1HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1140 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115981100-B Hydrofluoric acid-resistant protective material for lithography and lithography process thereof 湖南梵鑫新材料股份有限公司 2026-05-12 CN claimed
US-20250177927-A1 SUPPORTED MEMBRANES BY THERMAL AND UV INITITATED MASS POLYMERIZATION PROMERUS, LLC (US) 2025-06-05 US claimed
EP-4563614-A1 CURABLE COMPOSITION COMPRISING A MULTIFUNCTIONAL HALOGENATED THIOXANTHONE AND ITS USES ARKEMA FRANCE (FR) 2025-06-04 EP claimed
US-20250122402-A1 LONG SHELF-LIFE STABLE MASS POLYMERIZABLE POLYCYCLOOLEFIN COMPOSITIONS CONTAINING PYRIDINE LIGATED PALLADIUM COMPOUNDS PROMERUS, LLC (US) 2025-04-17 US claimed
US-12187851-B2 Network polymers and methods of making and using same THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) 2025-01-07 US claimed
CN-111045296-B UV patternable polymer blend for organic thin film transistor 康宁股份有限公司 2024-12-27 CN claimed
CN-118684557-B Polyacrylonitrile alcohol type single-molecule resin photoresist based on adamantane core, and preparation method and application thereof 中国科学院理化技术研究所 2024-12-03 CN claimed
CN-118851883-A Tertiary alcohol type single-molecule resin photoresist based on adamantane structure, and preparation method and application thereof 中国科学院理化技术研究所 2024-10-29 CN claimed
CN-118684557-A Polyacrylonitrile alcohol type single-molecule resin photoresist based on adamantane core, and preparation method and application thereof 中国科学院理化技术研究所 2024-09-24 CN claimed
CN-118092074-B Chemical amplification type positive photosensitive polyimide coating adhesive and preparation method and application thereof 明士(北京)新材料开发有限公司 2024-08-20 CN claimed
EP-1558969-A2 INCORPORATION OF MARKINGS IN OPTICAL MEDIA Spectra Systems Corporation (US) 2005-08-03 EP claimed
EP-1540416-A2 SYSTEM FOR APPLYING MARKINGS TO OPTICAL MEDIA Spectra Systems Corporation (US) 2005-06-15 EP claimed
US-20050018595-A1 System for applying markings to optical media SPECTRA SYSTEMS CORPORATION 2005-01-27 US claimed
US-6794109-B2 POLYMER CONTAINING A FLUORINATED STYRENE COPOLYMER MASSACHUSETTS INSTITUTE OF TECHNOLOGY 2004-09-21 US claimed
US-20040121268-A1 Incorporation of markings in optical media SPECTRA SYSTEMS CORPORATION 2004-06-24 US claimed
WO-2004042704-A2 INCORPORATION OF MARKINGS IN OPTICAL MEDIA SPECTRA SYSTEMS CORPORATION (US) 2004-05-21 WO claimed
WO-2004027683-A2 SYSTEM FOR APPLYING MARKINGS TO OPTICAL MEDIA SPECTRA SYSTEMS CORPORATION (US) 2004-04-01 WO claimed
US-20020160297-A1 Low abosorbing resists for 157 nm lithography AIR FORCE, UNITED STATES 2002-10-31 US claimed
WO-2002069043-A2 LOW ABSORBING RESISTS FOR 157 NM LITHOGRAPHY MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2002-09-06 WO claimed
US-6235446-B1 MIXTURE OF P-HYDROXYSTYRENE, ACRYLATED ESTER JSR CORPORATION (JP) 2001-05-22 US claimed