⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9705098 | 0.69 | — | — | |
| SCHEMBL232182 | 0.67 | — | — | |
| SCHEMBL6659883 | 0.67 | — | — | |
| SCHEMBL9664191 | 0.67 | — | — | |
| SCHEMBL28259887 | 0.64 | — | — | |
| SCHEMBL96706 | 0.63 | TSHR (0.33) | — | |
| SCHEMBL263071 | 0.63 | — | — | |
| SCHEMBL15603194 | 0.63 | — | — | |
| SCHEMBL6179113 | 0.63 | ALDH1A1 (0.32) | — | |
| SCHEMBL2426801 | 0.61 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6936537-B2 | Methods for forming low-k dielectric films | THE BOC GROUP, INC. (US) | 2005-08-30 | — | — | US | claimed |
| EP-1271634-A2 | Methods for forming low-K dielectric films | THE BOC GROUP, INC. (US) | 2003-01-02 | — | — | EP | claimed |
| US-20020192980-A1 | Methods for forming low-k dielectric films | BOC GROUP, INC., THE | 2002-12-19 | — | — | US | claimed |
| CN-118662665-A | Preparation and application of CT/MR dual-function imaging nano drug-carrying material | 中国科学院宁波材料技术与工程研究所 | 2024-09-20 | — | — | CN | disclosed |
| CN-113528005-A | Nano high-temperature-resistant self-cleaning transparent coating | 上海涂尊新材料科技有限公司 | 2021-10-22 | — | — | CN | disclosed |
| EP-1271634-A3 | Methods for forming low-K dielectric films | THE BOC GROUP, INC. (US) | 2006-04-19 | — | — | EP | disclosed |
| US-6936537-B2 | Methods for forming low-k dielectric films | THE BOC GROUP, INC. (US) | 2005-08-30 | — | — | US | disclosed |
| EP-1271634-A2 | Methods for forming low-K dielectric films | THE BOC GROUP, INC. (US) | 2003-01-02 | — | — | EP | disclosed |
| EP-1271634-A2 | Methods for forming low-K dielectric films | THE BOC GROUP, INC. (US) | 2003-01-02 | — | — | EP | disclosed |
| US-20020192980-A1 | Methods for forming low-k dielectric films | BOC GROUP, INC., THE | 2002-12-19 | — | — | US | disclosed |