Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.36 |
| ▸ | CA2 | P00918 | 3/20 | 0.36 |
| ▸ | CA7 | P43166 | 2/20 | 0.36 |
| ▸ | CA9 | Q16790 | 2/20 | 0.36 |
| ▸ | CA12 | O43570 | 1/20 | 0.36 |
| ▸ | CA4 | P22748 | 1/20 | 0.36 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.30 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6703730 | 0.82 | CA1 (0.45) | CA1CA2CA7CA9CA12 | |
| SCHEMBL9117232 | 0.79 | CA12 (0.33) | CA1CA2CA7CA9CA12 | |
| SCHEMBL18925853 | 0.75 | ALDH1A1 (0.39) | CA1CA2CA7CA9CA12 | |
| SCHEMBL10913475 | 0.73 | TSHR (0.50) | CA1CA2CA7CA9CA12 | |
| SCHEMBL27932248 | 0.73 | CA1 (0.65) | CA1CA2CA7CA9CA12 | |
| SCHEMBL31036946 | 0.73 | TSHR (0.50) | CA1CA2CA7CA9CA12 | |
| SCHEMBL27825193 | 0.72 | — | — | |
| SCHEMBL7 | 0.72 | — | — | |
| SCHEMBL8464066 | 0.71 | LMNA (0.42) | CA1CA2CA7CA9CA12 | |
| SCHEMBL9196056 | 0.71 | ALDH1A1 (0.56) | CA1CA2CA7CA9CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-63090534-A | — | — | None | — | — | JP | disclosed |
| EP-1123321-B1 | SUPPORTED BIDENTATE AND TRIDENTATE CATALYST COMPOSITIONS AND OLEFIN POLYMERIZATION USING SAME | GRACE W R & CO (US) | 2006-12-20 | — | — | EP | disclosed |
| US-7108955-B2 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-09-19 | — | — | US | disclosed |
| CN-1249126-C | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORP (JP) | 2006-04-05 | — | — | CN | disclosed |
| US-6846895-B2 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-01-25 | — | — | US | disclosed |
| US-20040143082-A1 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-22 | — | — | US | disclosed |
| CN-1505651-A | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR��ʽ���� | 2004-06-16 | — | — | CN | disclosed |
| CN-1146583-C | Supported bidentate and tridentate catalyst compositions and olefin polymerization using same | — | 2004-04-21 | — | — | CN | disclosed |
| EP-1398339-A1 | POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2004-03-17 | — | — | EP | disclosed |
| EP-1142928-B1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR CORP (JP) | 2004-02-18 | — | — | EP | disclosed |
| US-6531260-B2 | Photoresist | JSR CORPORATION (JP) | 2003-03-11 | — | — | US | disclosed |
| CN-1328576-A | Supported bidentate and tridentate catalyst compositions and olefin polymerization using same | GRACE W R & CO (US) | 2001-12-26 | — | — | CN | disclosed |
| US-20010041769-A1 | Polysiloxane, method of manufacturing same, silicon-containingalicyclic compouns, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1142928-A1 | Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin compounds | JSR Corporation (JP) | 2001-10-10 | — | — | EP | disclosed |
| US-6184171-B1 | CATALYST COMPOSITION COMPRISES AN ANIONIC METALLOID SILANE MODIFIED INORGANIC OXIDE AND THE CATIONIC REMNANT OF A TRANSITION METAL BIDENTATE OR TRIDENTATE COMPOUND | W.R. GRACE & CO. -CONN | 2001-02-06 | — | — | US | disclosed |
| JP-S6390534-A | ALKALI-SOLUBLE LADDER SILICONE POLYMER | HITACHI LTD | 1988-04-21 | — | — | JP | disclosed |
| US-4179511-A | Antibacterial 3-(5-tetrazolyl) penam compounds | PFIZER INC. (US) | 1979-12-18 | — | — | US | disclosed |
| US-4143039-A | ANTIBACTERIAL 3-(5-TETRAZOLYL)PENAM COMPOUNDS | PFIZER INC. (US) | 1979-03-06 | — | — | US | disclosed |
| US-4115385-A | PENICILLINS | PFIZER INC. (US) | 1978-09-19 | — | — | US | disclosed |
| US-3994939-A | BACTERICIDES | PFIZER INC. (US) | 1976-11-30 | — | — | US | disclosed |