SCHEMBL5743498

SCHEMBL5743498

CC(C)=C[C@@H](O)P(=O)(O)O

nearest known ligand 0.35

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 1/20 0.33
GRIN3B O60391 1/20 0.33
GRIN1 Q05586 1/20 0.33
GRIN2A Q12879 1/20 0.33
GRIN2B Q13224 1/20 0.33
GRIN2C Q14957 1/20 0.33
GRIN3A Q8TCU5 1/20 0.33
GABRR1 P24046 1/20 0.31
GABBR2 O75899 1/20 0.31
GABBR1 Q9UBS5 1/20 0.31
LAP3 P28838 1/20 0.31
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5746136 1.00 GRIN2D (0.33) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL5743503 1.00 GRIN2D (0.33) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL16564033 0.74 GRIN2D (0.34) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL27630943 0.71
SCHEMBL12608280 0.69 LAP3 (0.39) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL13178385 0.67 LAP3 (0.32) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL3280855 0.67
SCHEMBL3280852 0.67
SCHEMBL25401602 0.65 KDM4E (0.30)
Phosphoric Acid SCHEMBL5485139 0.63 CA2 (0.38) GABRR1GABBR2GABBR1LAP3CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0826652-B1 PROCESS FOR PREPARING ASYMMETRIC COMPOUND BY USING METAL COMPLEX NAGASE & CO LTD (JP) 2006-09-06 EP disclosed
US-6090969-A REACTING AN OPTICALLY ACTIVE BINAPHTHOL WITH AN ALKALI METAL ALUMINUM HYDRIDE OR A DIALKYLALUMINUM HYDRIDE AND AN ALKALI OR ALKALINE EARTH METAL BASE NAGASE AND CO., LTD. (JP) 2000-07-18 US disclosed
US-5847186-A Process for preparing asymmetric compound by using metal complex NAGASE & COMPANY, LTD. (JP) 1998-12-08 US disclosed
EP-0826652-A1 PROCESS FOR PREPARING ASYMMETRIC COMPOUND BY USING METAL COMPLEX NAGASE & COMPANY, LTD. (JP) 1998-03-04 EP disclosed