SCHEMBL575288

SCHEMBL575288

O=P(OC1CCCCC1)(OC1CCCCC1)C1CCCCC1

nearest known ligand 0.48

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.48
NPSR1 Q6W5P4 3/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
LMNA P02545 1/20 0.35
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
GAA P10253 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
EPHX1 P07099 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL575665 0.97 ACHE (0.45) ACHENPSR1MEN1KMT2ALMNA
SCHEMBL575480 0.87 ACHE (0.47) ACHENPSR1MEN1KMT2ALMNA
SCHEMBL575231 0.87 ACHE (0.47) ACHENPSR1MEN1KMT2ALMNA
SCHEMBL11519442 0.82 ACHE (0.39) ACHENPSR1MEN1KMT2A
SCHEMBL29159416 0.82 ACHE (0.43) ACHENPSR1MEN1KMT2ALMNA
SCHEMBL575155 0.82 ACHE (0.43) ACHENPSR1MEN1KMT2AGAA
SCHEMBL575102 0.80 ACHE (0.38) ACHE
SCHEMBL575103 0.80 ACHE (0.48) ACHENPSR1MEN1KMT2ALMNA
SCHEMBL29723017 0.78 ACHE (0.36) ACHE
SCHEMBL21362536 0.78 ACHE (0.36) ACHEGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 107 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8633127-B2 Selective hydrogenation catalyst and methods of making and using same CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2014-01-21 US claimed
US-12100809-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-24 US disclosed
US-20240297344-A1 NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-05 US disclosed
US-11616253-B2 Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2023-03-28 US disclosed
US-20220278370-A1 NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2022-09-01 US disclosed
US-11367899-B2 Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2022-06-21 US disclosed
US-20220149436-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2022-05-12 US disclosed
US-11283107-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2022-03-22 US disclosed
EP-3144064-B1 SELECTIVE HYDROGENATION CATALYST AND METHODS OF MAKING AND USING SAME CHEVRON PHILLIPS CHEMICAL CO LP (US) 2021-07-28 EP disclosed
CN-106848406-B Nonaqueous electrolyte solution for secondary battery and nonaqueous electrolyte secondary battery 三菱化学株式会社 2020-09-11 CN disclosed
CN-1630694-A Jet printing ink and method of ink jet printing FUJI PHOTO FILM CO LTD (JP) 2005-06-22 CN disclosed
CN-1630693-A Ink for inkjet recording and inkjet recording method FUJI PHOTO FILM CO LTD (JP) 2005-06-22 CN disclosed
CN-1628158-A Ink-jet recording ink and method of ink-jet recording FUJI PHOTO FILM CO LTD (JP) 2005-06-15 CN disclosed
CN-1622983-A Ink for inkjet recording, method for producing ink, and inkjet recording method FUJI PHOTO FILM CO LTD (JP) 2005-06-01 CN disclosed
CN-1561370-A Polycarbonate composition with excellent releasability from mode TEIJIN LTD (JP) 2005-01-05 CN disclosed
CN-1175047-C Aromatic polycarbonate composition ������������ʽ���� 2004-11-10 CN disclosed
CN-1429192-A Process for production of 2,2,6-trimethylcyclohexane-1.4-dione DEGUSSA (DE) 2003-07-09 CN disclosed
CN-1388811-A Process for preparation of moltem mixtures of aromatic hydroxyl compounds and carbonic diesters TEIJIN LTD (JP) 2003-01-01 CN disclosed
CN-1351632-A Aromatic polycarbonate composition TEIJIN LTD (JP) 2002-05-29 CN disclosed
US-4210577-A Stabilizers for synthetic polymers comprising 2,2,6,6-tetramethyl-4-piperidyl carboxylic acid ester, phosphonic acid ester and phenol ARGUS CHEMICAL CORPORATION (US) 1980-07-01 US disclosed