SCHEMBL576746

SCHEMBL576746

c1ccc(CSSc2ccccc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 3/20 0.52
MAPT P10636 1/20 0.52
HPGD P15428 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
MGLL Q99685 1/20 0.52
IDO1 P14902 3/20 0.41
NOS3 P29474 1/20 0.41
NOS1 P29475 1/20 0.41
NOS2 P35228 1/20 0.41
MAOB P27338 3/20 0.40
ALDH1A1 P00352 2/20 0.40
MAPK1 P28482 1/20 0.40
POLB P06746 1/20 0.40
MAOA P21397 2/20 0.39
CALM1 P0DP23 1/20 0.39
CTSL P07711 1/20 0.39
CTSB P07858 1/20 0.39
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Dibenzyl Disulfide SCHEMBL11856889 0.90 HSD17B10 (0.60) HSD17B10MAPTHPGDSMN1; SMN2MGLL
SCHEMBL28938496 0.85 MAOB (0.38) HSD17B10MAPTHPGDSMN1; SMN2MGLL
SCHEMBL19869163 0.85 MAOA (0.40) HSD17B10MAPTHPGDSMN1; SMN2MGLL
SCHEMBL19869165 0.85 MAOB (0.40) HSD17B10MAPTHPGDSMN1; SMN2MGLL
SCHEMBL19869166 0.85 APP (0.40) HSD17B10MAPTHPGDSMN1; SMN2MGLL
SCHEMBL776238 0.85 SMN1; SMN2 (0.42) HSD17B10MAPTHPGDSMN1; SMN2MGLL
SCHEMBL19869137 0.85 MAPT (0.42) HSD17B10MAPTHPGDSMN1; SMN2MGLL
SCHEMBL19869167 0.85 HSD17B10 (0.42) HSD17B10MAPTHPGDSMN1; SMN2MGLL
SCHEMBL19869134 0.83 MEN1 (0.49) HSD17B10MAPTHPGDSMN1; SMN2MGLL
SCHEMBL22288486 0.82 HTR2C (0.40) HSD17B10MAPTHPGDSMN1; SMN2MGLL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12100809-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-24 US disclosed
US-20240297344-A1 NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2024-09-05 US disclosed
CN-115911573-A Nonaqueous electrolyte solution for secondary battery and nonaqueous electrolyte secondary battery using same 三菱化学株式会社 2023-04-04 CN disclosed
US-11616253-B2 Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2023-03-28 US disclosed
US-20220278370-A1 NONAQUEOUS ELECTROLYTE FOR SECONDARY BATTERY AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2022-09-01 US disclosed
US-11367899-B2 Nonaqueous electrolyte for secondary battery and nonaqueous-electrolyte secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2022-06-21 US disclosed
US-20220149436-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2022-05-12 US disclosed
US-11283107-B2 Non-aqueous liquid electrolyte and non-aqueous liquid electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2022-03-22 US disclosed
CN-106848406-B Nonaqueous electrolyte solution for secondary battery and nonaqueous electrolyte secondary battery 三菱化学株式会社 2020-09-11 CN disclosed
CN-111048841-A Nonaqueous electrolyte solution for secondary battery and nonaqueous electrolyte secondary battery using same 三菱化学株式会社 2020-04-21 CN disclosed
US-20090325065-A1 NON-AQUEOUS LIQUID ELECTROLYTE AND NON-AQUEOUS LIQUID ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2009-12-31 US disclosed
CN-101432923-A Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery MITSUBISHI CHEM CORP (JP) 2009-05-13 CN disclosed
EP-2012386-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY Mitsubishi Chemical Corporation (JP) 2009-01-07 EP disclosed
CN-1232884-C Photoresisting agent composition SHIPLEY INC (US) 2005-12-21 CN disclosed
CN-1229692-C Photo-corrosion-resisting agent composition HIPPLY CO (US) 2005-11-30 CN disclosed
CN-1428653-A Photoresisting agent composition SHIPLEY INC (US) 2003-07-09 CN disclosed
CN-1427307-A Photo-corrosion-resisting agent composition HIPPLY CO (US) 2003-07-02 CN disclosed
EP-0799712-B1 Recording medium, ink-jet recording method and printed product CANON KK (JP) 2000-10-11 EP disclosed
US-5989650-A INK RECEIVING LAYER OF CURABLE POLYVINYL ACETAL RESIN AND CATIONIC POLYMER CANON KABUSHIKI KAISHA (JP) 1999-11-23 US disclosed
EP-0799712-A1 Recording medium, ink-jet recording method and printed product CANON KABUSHIKI KAISHA (JP) 1997-10-08 EP disclosed