⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL581852 | 0.96 | — | — | |
| SCHEMBL11793503 | 0.96 | — | — | |
| SCHEMBL767014 | 0.87 | — | — | |
| SCHEMBL69188 | 0.77 | — | — | |
| SCHEMBL580421 | 0.67 | — | — | |
| SCHEMBL11829612 | 0.65 | — | — | |
| SCHEMBL1581331 | 0.64 | — | — | |
| SCHEMBL19075324 | 0.64 | — | — | |
| SCHEMBL9766049 | 0.64 | — | — | |
| SCHEMBL19068079 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 726 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107963982-B | Polyisocyanate composition and isocyanate polymer composition | 旭化成株式会社 | 2021-11-12 | — | — | CN | claimed |
| CN-1332205-A | Radiation-sensitive resin composition | JSR CORP (JP) | 2002-01-23 | — | — | CN | claimed |
| EP-0589301-A1 | Carboxynilides derivatives, process for their preparation and fungicidal compositions containing them | BASF Aktiengesellschaft (DE) | 1994-03-30 | — | — | EP | claimed |
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| CN-118290298-A | Benzoyl hydrazine compound and synthetic method and application thereof | 南京农业大学 | 2024-07-05 | — | — | CN | disclosed |
| CN-115594848-B | Polybenzoxazole precursors and uses thereof | 律胜科技股份有限公司 | 2024-07-02 | — | — | CN | disclosed |
| US-20240201593-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| CN-118215651-A | Method for producing isocyanate compound, method for producing urethane compound, method for recovering amine compound, and isocyanate composition | 旭化成株式会社 | 2024-06-18 | — | — | CN | disclosed |
| CN-118159910-A | Additive-containing silicon-containing resist underlayer film forming composition | 日产化学株式会社 | 2024-06-07 | — | — | CN | disclosed |
| CN-113518762-B | Release layer dispersion of layered compound and transparent substrate using the same | 公立大学法人大阪 | 2024-05-28 | — | — | CN | disclosed |
| CN-114423742-B | Benzotriazole-based compound, light absorber and resin composition | 三井化学株式会社 | 2024-05-28 | — | — | CN | disclosed |
| US-4086224-A | Reduction process for making azo compound | PENNWALT CORPORATION (US) | 1978-04-25 | — | — | US | disclosed |
| US-4069377-A | Polymerization of ethylenically unsaturated monomers employing secondary-aliphatic α-substituted azoalkanes | PENNWALT CORPORATION | 1978-01-17 | — | — | US | disclosed |
| US-4048423-A | Process for polymerizing unsaturated monomers and unsaturated polyester resins employing unsymmetrical tertiary-aliphatic azoalkanes | PENNWALT CORPORATION (US) | 1977-09-13 | — | — | US | disclosed |
| US-4029615-A | AZO COMPOUNDS | PENNWALT CORPORATION (US) | 1977-06-14 | — | — | US | disclosed |
| US-4025502-A | POLYMERIZATION CATALYSTS, CURING AGENTS | PENNWALT CORPORATION (US) | 1977-05-24 | — | — | US | disclosed |
| US-4009157-A | POLYESTER FOAMING AGENTS, FREE RADICAL CATALYSTS | PENNWALT CORPORATION (US) | 1977-02-22 | — | — | US | disclosed |
| US-4007165-A | VINYL POLYMERIZATION INITIATORS POLYESTER CURING AGENTS | PENNWALT CORPORATION (US) | 1977-02-08 | — | — | US | disclosed |
| US-3993609-A | ACID SENSITIVE AZO PROMOTERS | PENNWALT CORPORATION (US) | 1976-11-23 | — | — | US | disclosed |
| US-3936479-A | 2-BENZAMIDO-BENZOPHENONES, UV STABILIZERS, PLASTICS | SANDOZ LTD., (SANDOZ AG) (CH) | 1976-02-03 | — | — | US | disclosed |