SCHEMBL767014

SCHEMBL767014

CC1([O])CCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL581765 0.87
SCHEMBL581852 0.84
SCHEMBL11793503 0.84
SCHEMBL69188 0.80
SCHEMBL5187 0.70
SCHEMBL1144463 0.70
Ammonia Solution, Strong SCHEMBL4642805 0.67
SCHEMBL22000997 0.67
SCHEMBL2344061 0.67
SCHEMBL11900984 0.65 FFAR3 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 380 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109265995-A A kind of polymerized hindered amine light stabilizer and its application 北京天罡助剂有限责任公司 2019-01-25 CN claimed
EP-2731436-A1 AZAINDOLE COMPOUNDS AND METHODS FOR TREATING HIV VIIV Healthcare UK Limited (GB) 2014-05-21 EP claimed
WO-2013012649-A1 AZAINDOLE COMPOUNDS AND METHODS FOR TREATING HIV GLAXOSMITHKLINE LLC (US) 2013-01-24 WO claimed
US-20130018049-A1 Azaindole Compounds and Methods for Treating HIV GLAXOSMITHKLINE LLC (US) 2013-01-17 US claimed
WO-2012102985-A1 ISOQUINOLINE COMPOUNDS AND METHODS FOR TREATING HIV GLAXOSMITHKLINE LLC (US) 2012-08-02 WO claimed
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
WO-2024138286-A1 IL-17A MODULATORS USYNOVA PHARMACEUTICALS, LTD. (CN) 2024-07-04 WO disclosed
WO-2024139171-A1 IL-17A MODULATORS USYNOVA PHARMACEUTICALS, LTD. (CN) 2024-07-04 WO disclosed
CN-115594848-B Polybenzoxazole precursors and uses thereof 律胜科技股份有限公司 2024-07-02 CN disclosed
US-20240201593-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-06-20 US disclosed
CN-118159910-A Additive-containing silicon-containing resist underlayer film forming composition 日产化学株式会社 2024-06-07 CN disclosed
CN-113518762-B Release layer dispersion of layered compound and transparent substrate using the same 公立大学法人大阪 2024-05-28 CN disclosed
WO-1999063829-A2 METHOD FOR CONTROLLING PESTS IN BT COTTON CULTURES AVENTIS CROPSCIENCE GMBH (DE) 1999-12-16 WO disclosed
EP-0945445-A1 1,5-BENZODIAZEPINE DERIVATIVES ZERIA PHARMACEUTICAL CO., LTD. (JP) 1999-09-29 EP disclosed
EP-0923562-A1 SUBSTITUTED P-TRIFLUOROMETHYLPHENYLURACILS BAYER AG (DE) 1999-06-23 EP disclosed
WO-1998057969-A1 4-HALOALKYL-3- HETEROCYCLYLPYRIDINES AND 4-HALOALKYL -5-HETEROCYCLYLPYRIDINES, METHOD FOR THE PRODUCTION THEREOF, AGENTS CONTAINING THE SAME AND THEIR USE AS PESTICIDES HOECHST SCHERING AGREVO GMBH (DE) 1998-12-23 WO disclosed
WO-1998046571-A1 METHODS FOR SYNTHESIZING 2-SUBSTITUTED IMIDAZOLES SEPRACOR INC. (US) 1998-10-22 WO disclosed
US-5817823-A ALKYLATION OF AN IMIDAZOLE COMPOUND; COUPLING WITH NUCLEOPHILIC COMPOUND SEPRACOR INC. (US) 1998-10-06 US disclosed
WO-1998006706-A1 SUBSTITUTED P-TRIFLUOROMETHYLPHENYLURACILS BAYER AKTIENGESELLSCHAFT (DE) 1998-02-19 WO disclosed
EP-0011670-A2 Cycloheptatriene derivatives and process for their preparation BAYER AG (DE) 1980-06-11 EP disclosed